Lithographic projection apparatus and device manufacturing method
First Claim
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1. A lithographic projection apparatus comprising:
- an illumination system arranged to condition a radiation beam;
a support structure configured to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern;
a substrate table configured to hold a substrate;
a projection system arranged to project the patterned radiation beam onto a target portion of the substrate, the projection system comprising two separate physical parts that are decoupled, wherein each part comprises an optical element or the projection system; and
a liquid supply system configured to at least partly fill a space between the projection system and the substrate, with a liquid.
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Abstract
A lithographic projection apparatus is disclosed where at least part of a space between a projection system of the apparatus and a substrate is filled with a liquid by a liquid supply system. The projection system is separated into two separate physical parts. With substantially no direct connection between the two parts of the projection system, vibrations induced in a first of the two parts by coupling of forces through the liquid filling the space when the substrate moves relative to the liquid supply system affects substantially only the first part of the projection system and not the other second part.
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Citations
21 Claims
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1. A lithographic projection apparatus comprising:
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an illumination system arranged to condition a radiation beam;
a support structure configured to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern;
a substrate table configured to hold a substrate;
a projection system arranged to project the patterned radiation beam onto a target portion of the substrate, the projection system comprising two separate physical parts that are decoupled, wherein each part comprises an optical element or the projection system; and
a liquid supply system configured to at least partly fill a space between the projection system and the substrate, with a liquid. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A device manufacturing method, comprising:
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providing a liquid to a space between a substrate on a substrate table of a lithographic apparatus and a first part of a projection system of the lithographic apparatus, a second part of the projection system being substantially decoupled from the first part; and
projecting a patterned beam of radiation, using the first and second parts of the projection system, through the liquid onto a target portion of a substrate. - View Dependent Claims (13, 14, 15, 16, 17, 18, 19, 20, 21)
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Specification