X-ray multi-layer mirror and x-ray exposure apparatus

• US 20050031071A1
• Filed: 07/30/2004
• Published: 02/10/2005
• Est. Priority Date: 08/08/2003
• Status: Active Grant

• Current Assignee: Canon Ayutthaya Limited (Canon Inc.)
• Original Assignee: Canon Ayutthaya Limited (Canon Inc.)
• Inventors: Ando, Kenji, Kanazawa, Hidehiro, Imai, Kyoko
• Granted Patent: US 7,162,009 B2
• Time in Patent Office: Days
• US Class Current: 378/34
• CPC Class Codes: B82Y 10/00 Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
• CPC Class Codes: G03F 7/2039 X-ray radiation
• CPC Class Codes: G03F 7/70316 Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
• CPC Class Codes: G03F 7/70958 Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
• CPC Class Codes: G21K 1/062 Devices having a multilayer structure

Abstract

An X-ray multi-layer mirror having a reflection characteristic with a wider incident angle range is realized by conducting optimization processing on an Mo/Si alternate layer having a constant thickness. Film thickness distributions of Si layers and Mo layers in the Mo/Si alternate layer are determined by optimization processing for widening the angle reflection characteristic of the Mo/Si alternate layer having the constant thickness, which is a fundamental structure.

Claims

1. An X-ray multi-layer mirror comprising an Mo/Si alternate layer with a non-uniform film thickness structure, which is produced by conducting optimization processing for widening an X-ray reflection characteristic on a constant film thickness fundamental structure of an Mo/Si alternate layer having the X-ray reflection characteristic, wherein each of all of Mo layers and Si layers for forming the non-uniform film thickness structure is designed to have a film thickness of 1.5 nm or more.

2. An X-ray exposure apparatus comprising a projection optical system comprising an X-ray multi-layer mirror according to claim 1, wherein a pattern of an original plate is transferred to a substrate by the projection optical system.