Method and apparatus for mapping platform-based design to multiple foundry processes
First Claim
1. A method for mapping platform-based design to multiple foundry processes, comprising steps of:
- (a) checking availability of required features of a design in a target foundry process, said design including base wafer layers and metal stack layers;
(b) selecting a base wafer/metal stack interface layer for said design;
(c) creating compatible blocks between a first base wafer process of said target foundry process and a second base wafer process of a second foundry process;
(d) creating a physical design library for said design; and
(e) creating a logic design and timing library for said design, whereby said design is implemented in both said target foundry process and said second foundry process.
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Abstract
The present invention is directed to a method and apparatus for mapping platform-based design to multiple foundry processes. According to an exemplary aspect of the present invention, a method for mapping platform-based design to multiple foundry processes may include the following steps. First, availability of required features of a design in a target foundry process may be checked. The target foundry process must provide all the features that are used in the design. The design may include base wafer layers and metal stack layers. Then, a base wafer/metal stack interface layer for the design may be selected. Next, compatible blocks between different base wafer processes may be created. Then, a physical design library for the design may be created. Next, a logic design and timing library for the design may be created. This way, the design may be mapped to different foundry processes.
53 Citations
23 Claims
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1. A method for mapping platform-based design to multiple foundry processes, comprising steps of:
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(a) checking availability of required features of a design in a target foundry process, said design including base wafer layers and metal stack layers;
(b) selecting a base wafer/metal stack interface layer for said design;
(c) creating compatible blocks between a first base wafer process of said target foundry process and a second base wafer process of a second foundry process;
(d) creating a physical design library for said design; and
(e) creating a logic design and timing library for said design, whereby said design is implemented in both said target foundry process and said second foundry process. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. An apparatus for mapping platform-based design to multiple foundry processes, comprising:
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(a) means for checking availability of required features of a design in a target foundry process, said design including base wafer layers and metal stack layers;
(b) means for selecting a base wafer/metal stack interface layer for said design;
(c) means for creating compatible blocks between a first base wafer process of said target foundry process and a second base wafer process of a second foundry process;
(d) means for creating a physical design library for said design; and
(e) means for creating a logic design and timing library for said design, wherein said design is implemented in both said target foundry process and said second foundry process. - View Dependent Claims (9, 10, 11, 12, 13, 14)
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15. A computer-readable medium having computer-executable instructions for performing a method for mapping platform-based design to multiple foundry processes, said method comprising steps of:
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(a) checking availability of required features of a design in a target foundry process, said design including base wafer layers and metal stack layers;
(b) selecting a base wafer/metal stack interface layer for said design;
(c) creating compatible blocks between a first base wafer process of said target foundry process and a second base wafer process of a second foundry process;
(d) creating a physical design library for said design; and
(e) creating a logic design and timing library for said design, whereby said design is implemented in both said target foundry process and said second foundry process. - View Dependent Claims (16, 17, 18, 19, 20, 21)
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22. A method for mapping platform-based design to multiple foundry processes, comprising steps of:
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(a) checking availability of required features of a design in a target foundry process;
(b) substituting blocks for said target foundry process into said design;
(c) performing physical design rule check and electrical checks on said design; and
(d) generating masks for base wafer layers of said target foundry process.
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23. A computer-readable medium having computer-executable instructions for performing a method for mapping platform-based design to multiple foundry processes, said method comprising steps of:
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(a) checking availability of required features of a design in a target foundry process;
(b) substituting blocks for said target foundry process into said design;
(c) performing physical design rule check and electrical checks on said design; and
(d) generating masks for base wafer layers of said target foundry process.
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Specification