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Lithographic apparatus and device manufacturing method

  • US 20050036123A1
  • Filed: 07/20/2004
  • Published: 02/17/2005
  • Est. Priority Date: 07/21/2003
  • Status: Active Grant
First Claim
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1. A lithographic apparatus, comprising:

  • a substrate holder configured to hold a substrate;

    an illuminator configured to condition a beam of radiation;

    a support structure configured to support a patterning device that imparts a desired pattern onto the beam of radiation, the support structure including a stage;

    a projection system that projects the patterned beam to a target portion of the substrate; and

    a controller configured to control a quantity representing an attribute of a movable part of the apparatus, the controller comprising;

    at least two integrators connected in series;

    an integrator output circuit configured to derive an output quantity of the series-connected integrators from a respective output quantity of at least one of the integrators of the series-connected integrators;

    an integrator saturator operatively coupled to the integrator output circuit, the integrator saturator having an operating area in which the output quantity is passed through and a saturation area in which the output quantity is limited; and

    a saturation controller configured to set the output quantity of at least one of the series-connected integrators to a neutral value when the integrator saturator is in the saturation area, except when an input quantity or the output quantity of at least one of the series-connected integrators has a value that is capable of bringing the integrator saturator from the saturation region to the operating area.

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