Lithographic apparatus and device manufacturing method
First Claim
1. A lithographic apparatus, comprising:
- a substrate holder configured to hold a substrate;
an illuminator configured to condition a beam of radiation;
a support structure configured to support a patterning device that imparts a desired pattern onto the beam of radiation, the support structure including a stage;
a projection system that projects the patterned beam to a target portion of the substrate; and
a controller configured to control a quantity representing an attribute of a movable part of the apparatus, the controller comprising;
at least two integrators connected in series;
an integrator output circuit configured to derive an output quantity of the series-connected integrators from a respective output quantity of at least one of the integrators of the series-connected integrators;
an integrator saturator operatively coupled to the integrator output circuit, the integrator saturator having an operating area in which the output quantity is passed through and a saturation area in which the output quantity is limited; and
a saturation controller configured to set the output quantity of at least one of the series-connected integrators to a neutral value when the integrator saturator is in the saturation area, except when an input quantity or the output quantity of at least one of the series-connected integrators has a value that is capable of bringing the integrator saturator from the saturation region to the operating area.
1 Assignment
0 Petitions
Accused Products
Abstract
A lithographic apparatus is presented that includes a controller having a series connection of at least two integrators and an integrator output circuit for deriving an output quantity of the series connection of integrators. The controller also includes an integrator saturator that is operatively coupled to the integrator output circuit and having an operating area for passing through the output quantity and a saturation area for saturating the output quantity. A saturation control mechanism for controlling saturation sets an output quantity of at least one of the series-connected integrators to a neutral value, when the integrator saturator is in the saturation area, except when the output quantity of or an input quantity of at least one of the series-connected integrators has a value such that it would tend to bring the integrator saturator from the saturation area to the operating area.
8 Citations
12 Claims
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1. A lithographic apparatus, comprising:
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a substrate holder configured to hold a substrate;
an illuminator configured to condition a beam of radiation;
a support structure configured to support a patterning device that imparts a desired pattern onto the beam of radiation, the support structure including a stage;
a projection system that projects the patterned beam to a target portion of the substrate; and
a controller configured to control a quantity representing an attribute of a movable part of the apparatus, the controller comprising;
at least two integrators connected in series;
an integrator output circuit configured to derive an output quantity of the series-connected integrators from a respective output quantity of at least one of the integrators of the series-connected integrators;
an integrator saturator operatively coupled to the integrator output circuit, the integrator saturator having an operating area in which the output quantity is passed through and a saturation area in which the output quantity is limited; and
a saturation controller configured to set the output quantity of at least one of the series-connected integrators to a neutral value when the integrator saturator is in the saturation area, except when an input quantity or the output quantity of at least one of the series-connected integrators has a value that is capable of bringing the integrator saturator from the saturation region to the operating area. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A method of controlling a quantity representing an attribute of a moving element, comprising:
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deriving an output quantity of at least two series-connected integrators from a respective output quantity of at least one of the integrators;
passing through the output quantity when the output quantity does not exceed a predetermined value;
limiting the output quantity when the output quantity exceeds the predetermined value; and
controlling saturation by setting an output quantity of at least one of the series-connected integrators to a neutral value when the output quantity of the series connection of integrators exceeds the predetermined value, except when an input quantity or the output quantity of at least one of the series-connected integrators has a value that is capable of bringing the output quantity of the series-connected integrators below the predetermined value.
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10. A device manufacturing method, comprising:
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providing a substrate that is at least partially covered by a layer of radiation-sensitive material;
conditioning a beam of radiation;
endowing the conditioned beam of radiation with a desired pattern in its cross-section;
projecting the patterned beam of radiation onto a target portion of the substrate; and
controlling a quantity representing an attribute of a movable part, wherein the controlling comprises;
deriving an output quantity of at least two series-connected integrators from a respective output quantity of at least one of the integrators;
passing through the output quantity when the output quantity does not exceed a predetermined value;
limiting the output quantity when the output quantity exceeds the predetermined value; and
controlling saturation by setting an output quantity of at least one of the series-connected integrators to a neutral value when the output quantity of the series connection of integrators exceeds the predetermined value, except when an input quantity or the output quantity of at least one of the series-connected integrators has a value that is capable of bringing the output quantity of the series-connected integrators below the predetermined value.
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11. A controller for controlling a quantity representing an attribute of a moving element, the controller comprising:
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at least two integrators connected in series;
an integrator output circuit that derives an output quantity of the series connection of integrators from a respective output quantity of at least one of the integrators of the series connection of integrators;
an integrator saturator, operatively coupled to the integrator output circuit, the integrator saturator having an operating region for passing through the output quantity and a saturation region for limiting the output quantity; and
a saturation control mechanism configured to set the output quantity of at least one of the series-connected integrators to a neutral value when the integrator saturator is in the saturation area, except when an input quantity or the output quantity of at least one of the series-connected integrators has a value that is capable of bringing the integrator saturator from the saturation region to the operating region.
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12. A computer-readable storage medium storing a set of instructions which, when executed, performs the control of a quantity representing an attribute of a moving element by:
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deriving an output quantity of at least two integrators connected in series from at least one of the integrators;
passing through the output quantity when the output quantity does not exceed a predetermined value;
limiting the output quantity when the output quantity exceeds the predetermined value; and
controlling saturation by setting an output quantity of at least one of the series-connected integrators to a neutral value when the output quantity of the series connection of integrators exceeds the predetermined value, except when an input quantity or the output quantity of at least one of the series-connected integrators has a value that is capable of bringing the output quantity of the series-connected integrators below the predetermined value.
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Specification