Filter window, lithographic projection apparatus, filter window manufacturing method, device manufacturing method and device manufactured thereby
First Claim
1. A filter window for EUV lithography comprising:
- a pellicle comprising a first layer comprising a material selected from the group consisting of AlN, Ru, Ir, Au, SiN, Rh, C, and combinations thereof; and
a wire structure for supporting said pellicle.
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Accused Products
Abstract
The invention relates to a filter window for EUV lithography comprising a pellicle, a wire structure for supporting the pellicle, characterized in that the pellicle comprises a first layer comprising at least one of AlN, Ru, Ir, Au, SiN, Rh, C. A pellicle with these materials has a very low EUV absorption in combination with a minimal oxidation rate. In a particular embodiment, the thickness of the pellicle is between 30 nm and 100 nm. It can be easily checked that absorption of EUV radiation of such a thin pellicle is equal to known filter windows, i.e. about 50% at a wavelength of 13.5 nm wavelength, but the oxidation of the pellicle according to the invention is much smaller. The filter window can for example be used to separate a Projection Optics box and a wafer compartment of the apparatus or to shield a reticle from particle contamination.
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Citations
22 Claims
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1. A filter window for EUV lithography comprising:
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a pellicle comprising a first layer comprising a material selected from the group consisting of AlN, Ru, Ir, Au, SiN, Rh, C, and combinations thereof; and
a wire structure for supporting said pellicle. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 19, 20)
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11. A lithographic projection apparatus comprising:
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an illumination system for conditioning a beam of radiation;
a mask table provided with a mask holder for holding a mask;
a substrate table provided with a substrate holder for holding a substrate;
a projection system for imaging an irradiated portion of the mask onto a target portion of the substrate, and a filter window comprising;
a pellicle having a first layer comprising a material selected from the group consisting of AlN, Ru, Ir, Au, SiN, Rh, C and combinations thereof; and
a wire structure for supporting said pellicle. - View Dependent Claims (12, 21, 22)
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13. A filter window manufacturing method comprising:
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fabricating a structure of wires on a substrate;
depositing a lacquer over the wires and the substrate;
depositing a first layer comprising a material selected from the group consisting of AlN, Ru, Ir, Au, SiN, Rh, C and combinations thereof;
removing said lacquer;
removing said substrate, and baking said first layer. - View Dependent Claims (14, 15)
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16. A filter window manufacturing method comprising:
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depositing, onto a substrate soluble in a fluid, a first layer comprising a material selected from the group consisting of AlN, Ru, Ir, Au, SiN, Rh, C and combinations thereof;
dissolving said substrate in the fluid;
removing said first layer from the fluid by adhering said first layer to a wire structure; and
baking said first layer. - View Dependent Claims (17, 18)
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Specification