Deposition of silica coatings on a substrate
First Claim
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1. A process for depositing a silica coating upon a heated glass substrate comprising the steps of:
- a) providing a heated glass substrate having a surface upon which the coating is to be deposited; and
b) directing a precursor mixture comprising a silane, ammonia, oxygen and an inert carrier gas toward and along the surface to be coated, and reacting the mixture at or near the surface to form a silica coating on the surface of the glass substrate.
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Abstract
A process for the production of a silica coating on a glass substrate provides a precursor mixture of SiH4, NH3, and O2, preferably in the presence of C2H4 and an inert carrier gas. The precursor mixture is directed along a surface of the glass substrate in an atmospheric pressure, on-line, chemical vapor deposition process. The precursor mixture is reacted at the surface of the glass substrate to form a silica coating, essentially devoid of nitrogen, on the glass substrate.
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Citations
16 Claims
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1. A process for depositing a silica coating upon a heated glass substrate comprising the steps of:
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a) providing a heated glass substrate having a surface upon which the coating is to be deposited; and
b) directing a precursor mixture comprising a silane, ammonia, oxygen and an inert carrier gas toward and along the surface to be coated, and reacting the mixture at or near the surface to form a silica coating on the surface of the glass substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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16. A process for depositing a silica coating upon a heated glass substrate comprising the steps of:
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a) providing a heated glass substrate having a surface upon which the coating is to be deposited; and
b) premixing monosilane, ammonia, oxygen and an inert carrier gas to form a precursor mixture, directing the precursor mixture toward and along the surface to be coated, and reacting the mixture at or near the surface to form a silica coating on the surface of the glass substrate.
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Specification