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Lithographic apparatus and device manufacturing method

  • US 20050046813A1
  • Filed: 07/14/2004
  • Published: 03/03/2005
  • Est. Priority Date: 07/16/2003
  • Status: Active Grant
First Claim
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1. A lithographic apparatus comprising:

  • an illumination system configured to condition a radiation beam;

    a support constructed to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam;

    a substrate table constructed to hold a substrate;

    a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and

    a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, the liquid supply system comprising a temperature controller configured to adjust the temperature of the substrate, the liquid and at least a part of the projection system towards a substantially common target temperature.

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