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Interferometric modulation pixels and manufacturing method thereof

  • US 20050046922A1
  • Filed: 03/31/2004
  • Published: 03/03/2005
  • Est. Priority Date: 09/03/2003
  • Status: Abandoned Application
First Claim
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1. A method of manufacturing an interferometric modulation pixel, comprising:

  • forming a first electrode layer on a transparent substrate, wherein an uppermost layer of the first electrode layer is an insulating layer;

    forming a sacrificial layer on the insulating layer;

    forming at least two first openings in the sacrificial layer and the first electrode layer to demarcate and define a first electrode, wherein the first electrode is made from the first electrode layer;

    coating a photosensitive material on the sacrificial layer and in the first openings;

    patterning the photosensitive material to form supports in the first openings;

    forming a second electrode layer on the sacrificial layer and the supports;

    forming at least two second openings in the second electrode layer to define a second electrode, wherein the second electrode is made from the second electrode layer and the orientation of the two second openings is perpendicular to the two first openings;

    removing the sacrificial layer; and

    forming a hydrophobic layer on the insulating layer.

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