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Apparatus for processing substrate in chamber and maintenance method therefor

  • US 20050051102A1
  • Filed: 09/01/2004
  • Published: 03/10/2005
  • Est. Priority Date: 09/10/2003
  • Status: Abandoned Application
First Claim
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1. A substrate processing apparatus for processing a substrate in a chamber, comprising:

  • a chamber body forming a chamber which is a space for processing a substrate and having an opening in its upper portion;

    a closing member attached to said opening, for closing said opening;

    a holding part for holding a substrate in said chamber; and

    a moving mechanism for moving a lower surface of said holding part up to a level higher than an upper surface of an edge of said opening while said closing member is not attached to said opening.

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