Nanophase multilayer barrier and process
First Claim
1. A barrier layer, the layer comprising:
- a.) a porous inorganic material deposited onto a substrate; and
, b.) an organic material infiltrated into the porous inorganic material, so that a continuous layer is formed, the layer having barrier properties.
1 Assignment
0 Petitions
Accused Products
Abstract
A thin film barrier structure and process is disclosed, which is seen as particularly useful for use in devices that require protection from such common environmental species as oxygen and water. The disclosed barrier structure is of particular utility for such devices as implemented on flexible substrates, such as may be desirable for OLED-based or LCD-based devices. The disclosed barrier structure provides superior barrier properties, flexibility, as well as commercial-scale reproducibility, through the use of a novel organic/inorganic nanocomposite structure formed by infiltration of a porous inorganic layer by an organic material. The composite structure is produced by vacuum deposition techniques in the first preferred embodiment.
123 Citations
35 Claims
-
1. A barrier layer, the layer comprising:
-
a.) a porous inorganic material deposited onto a substrate; and
,b.) an organic material infiltrated into the porous inorganic material, so that a continuous layer is formed, the layer having barrier properties. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
-
-
18. A process for forming a barrier layer, comprising the steps:
-
a.) providing a substrate;
b.) depositing a porous inorganic material onto the substrate;
c.) infiltrating the porous inorganic material with a monomer; and
d.) providing curing means for polymerizing the monomer, thereby transforming the porous material and the monomer into the barrier layer, so that the layer has low-permeability characteristics. - View Dependent Claims (19, 20, 21, 22, 23, 24, 25, 26)
-
-
27. An organic semiconductor device, comprising:
-
a.) a substrate;
b.) a semiconductor material deposited onto the substrate, c.) a porous inorganic material deposited over the semiconductor material; and
,d.) an organic material infiltrated into the porous inorganic material so that a continuous barrier layer is formed over the semiconductor material, the layer thereby having barrier properties. - View Dependent Claims (28, 29, 30, 31, 32, 33, 34, 35)
-
Specification