Electro-optical device, method of manufacturing the same, and electronic apparatus
First Claim
1. An electro-optical device, comprising:
- a substrate;
data lines extending above the substrate;
scanning lines extending in a direction intersecting the data lines;
thin film transistors including semiconductor layers and gate electrodes to which scanning signals are supplied by the scanning lines;
pixel electrodes to which image signals are supplied by the data lines through the thin film transistors;
a plurality of interlayer insulating films arranged between the data lines, the thin film transistors, and the pixel electrodes; and
a passivation film arranged on a surface of at least one interlayer insulating film among the plurality of interlayer insulating films.
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Accused Products
Abstract
To provide an electro-optical device capable of reducing the likelihood of preventing moisture from permeating into a laminated structure formed on a substrate, in particular, thin film transistors that constitute the laminated structure and of performing a stable operation, and/or electro-optical device includes data lines, scanning lines, thin film transistors including semiconductor layers, and pixel electrodes to which image signals are supplied by the data lines through the thin film transistors, on a substrate. The electro-optical device may include an interlayer insulating film arranged between the data lines and the pixel electrodes, and a passivation film arranged on the surface of the interlayer insulating film.
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Citations
18 Claims
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1. An electro-optical device, comprising:
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a substrate;
data lines extending above the substrate;
scanning lines extending in a direction intersecting the data lines;
thin film transistors including semiconductor layers and gate electrodes to which scanning signals are supplied by the scanning lines;
pixel electrodes to which image signals are supplied by the data lines through the thin film transistors;
a plurality of interlayer insulating films arranged between the data lines, the thin film transistors, and the pixel electrodes; and
a passivation film arranged on a surface of at least one interlayer insulating film among the plurality of interlayer insulating films. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 18)
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12. A method of manufacturing an electro-optical device, comprising:
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extending data lines above a substrate;
extending scanning lines in a direction intersecting the data lines;
forming thin film transistors including semiconductor layers and gate electrodes to which scanning signals are supplied by the scanning lines;
forming pixel electrodes to which image signals are supplied by the data lines through the thin film transistors;
forming a plurality of interlayer insulating films arranged between the data lines, the thin film transistors, and the pixel electrodes; and
forming a passivation film on one or more interlayer insulating films among the plurality of interlayer insulating films. - View Dependent Claims (13, 14, 15, 16, 17)
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Specification