Polishing pad for chemical mechanical polishing
First Claim
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1. A polishing pad for chemical mechanical polishing comprising:
- a polishing body comprising a thermoplastic foam substrate having a surface comprising concave cells; and
a polishing agent coating an interior surface of said concave cells, wherein said polishing agent comprises an inorganic metal oxide that includes carbides or nitrides.
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Abstract
The present invention provides in one embodiment, a polishing pad 100 for chemical mechanical polishing. The polishing pad comprises a polishing body 110. The polishing body comprises a thermoplastic foam substrate 115 having a surface 120 comprising concave cells 125. A polishing agent 130 coats an interior surface 135 of the concave cells. The polishing agent comprises an inorganic metal oxide that includes carbides or nitrides. Yet another embodiment of the present invention is a method for preparing a polishing pad 200.
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Citations
20 Claims
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1. A polishing pad for chemical mechanical polishing comprising:
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a polishing body comprising a thermoplastic foam substrate having a surface comprising concave cells; and
a polishing agent coating an interior surface of said concave cells, wherein said polishing agent comprises an inorganic metal oxide that includes carbides or nitrides. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A method for preparing a polishing pad for chemical mechanical polishing, comprising:
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exposing closed cells within a thermoplastic foam substrate to provide a substrate surface comprising concave cells; and
coating an interior surface of said concave cells with a polishing agent comprising an inorganic metal oxide, wherein carbides and nitrides are incorporated into said inorganic metal oxide during said coating. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20)
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Specification