Gas processing apparatus, gas processing method and integrated valve unit for gas processing apparatus

• US 20050061377A1
• Filed: 11/02/2004
• Published: 03/24/2005
• Est. Priority Date: 08/24/1999
• Status: Abandoned Application

• Current Assignee: Hayashi Otsuki, Yutaka Miura
• Original Assignee: Hayashi Otsuki, Yutaka Miura
• Inventors: Miura, Yutaka, Otsuki, Hayashi
• Application Number:
  US10/979,094
• Publication Number:
  US 20050061377A1
• Time in Patent Office: Days
• US Class Current: 137/884
• CPC Class Codes: F16K 11/0856 having all the connecting conduits situated in more than one plane perpendicular to the axis of the plug
• CPC Class Codes: F17D 1/04 for distribution of gas
• CPC Class Codes: Y10T 137/87885 Sectional block structure

Abstract

A process gas line (255) for carrying WF₆ gas for nucleation, a process gas line (257) for carrying WF₆ gas for film deposition after nucleation are joined at a single joint (280) to a carrier gas line (256). A gas line (271) is connected to the joint (280) to carry a mixed gas of the carrier gas and WF₆ gas to a processing chamber defined by a processing vessel. Sections of the carrier gas line (256) and the gas line (271) extending on the opposite sides of the joint (280) extend along a straight line, and the process gas lines (255, 257) are perpendicular to the gas line (271).

Claims

1-16. -16. (Canceled).

17. A gas processing apparatus comprising:

a processing vessel;

a carrier gas line connecting a carrier gas source to the processing vessel; and

a first process gas line connected to the carrier gas line at a first junction to supply a first process gas into the carrier gas line so that the first process gas is carried by the carrier gas into the processing vessel;

wherein an axis of the carrier gas line extends straightly at least in an area from a position upstream of the first junction to a position downstream of the first junction, and an axis of the first process gas line intersects the axis of the carrier gas line at an angle at the first junction.

18. The gas processing apparatus according to claim 17, wherein the axis of the first process gas line intersects the axis of the carrier gas line at a right angle at the first junction.

19. The gas processing apparatus according to claim 17, further comprising a second process gas line connected to the carrier gas line at a second junction to supply a second process gas into the carrier gas line so that the second process gas is carried by the carrier gas into the processing vessel,

wherein an axis of the carrier gas line extends straightly at least in an area from a position upstream of the second junction to a position downstream of the second junction, and an axis of the second process gas line intersects the axis of the carrier gas line at an angle at the second junction.

20. The gas processing apparatus according to claim 19, wherein the first junction and the second junction is located at the same position on the carrier gas line.

21. The gas processing apparatus according to claim 19, wherein the axis of the carrier gas line extends straightly at least in an area from the position upstream of the first junction to the position downstream of the second junction.

22. The gas processing apparatus according to claim 19, wherein the axis of the first process gas line intersects the axis of the carrier gas line at a right angle at the first junction, and the axis of the second process gas line intersects the axis of the carrier gas line at a right angle at the second junction.

23. The gas processing apparatus according to claim 17, further comprising an integrated valve device arranged at the process gas line or the carrier gas line, the integrated valve device including:

a base block provided with a valve bore and first and second gas passages opening into the valve bore;

a valve element movably fitted into the valve bore of the base block; and

an actuator that drives the valve element.

24. The gas processing apparatus according to claim 23, wherein:

the valve element is provided with a gas passage hole extending therethrough and is fitted rotatably in the valve bore,

the valve element can be placed at a first angular position to interconnect the first and the second gas passages by the gas passage hole, or at a second angular position to disconnect the first and the second gas passages from each other.

25. The gas processing apparatus according to claim 23, wherein the valve element is fitted in the valve bore so as to be longitudinally movable in the direction of depth of the valve bore, and the valve element can be placed at a first position to connect the first and the second gas passages through the valve bore or at a second position to disconnect at the first and the second gas passages from each other.

26. A gas processing apparatus comprising:

a processing vessel;

a carrier gas line connected to the processing vessel;

a process gas line connected to the carrier gas line at a junction to supply a process gas into the carrier gas line so that the process gas is carried by the carrier gas into the processing vessel; and

a shutoff valve arranged in the process gas line arranged in the process gas line at a position upstream of the junction,

wherein a distance from the position in the process gas line to the junction and a sectional area of the process gas line are so determined that an amount of the process gas that flows out from the process gas line into the carrier gas line after the shutoff valve has been closed is not greater than a predetermined value.

27. A gas processing method comprising the steps of:

supplying a carrier gas into a carrier gas line connected to a processing vessel;

supplying a first process gas into the carrier gas line through a first process gas line so that the fist process gas is carried by the carrier gas to the processing vessel, wherein the first process gas line is connected to the carrier gas line at a first junction, and an axis of the carrier gas line extends straightly at least in an area from a position upstream of the first junction to a position downstream of the first junction, and an axis of the first process gas line intersects the axis of the carrier gas line at an angle at the first junction; and

processing a substrate placed in the processing vessel by a gas process using the process gas.

28. The method according to claim 27, wherein the carrier gas line has a molecular weight of 30 or below.

29. The method according to claim 27, further comprising the steps of:

stopping supplying the first process gas by closing a shutoff valve arranged in the carrier gas line at a position upstream of the first junction, thereby a process gas concentration in an end section of the process gas line downstream of the shutoff valve, relative to whole gasses remaining in the end section, is 1% or below, at any position of the end section.

30. The method according to claim 27, wherein the carrier gas is supplied to the carrier gas line at a flow rate of 100 sccm or above.

31. The method according to claim 27, further comprising the steps of:

stopping supplying the first process gas by closing a shutoff valve arranged in the carrier gas line at a position upstream of the first junction; and

supplying a second process gas into the carrier gas line through a second process gas line so that the second process gas is carried by the carrier gas to the processing vessel, wherein the second process gas line is connected to the carrier gas line at a second junction, and the axis of the carrier gas line extends straightly at least in an area from a position upstream of the second junction to a position downstream of the second junction, and an axis of the second process gas line intersects the axis of the carrier gas line at an angle at the second junction.