Method and apparatus for measurements of patterned structures
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Abstract
An apparatus and a method are disclosed for measuring at least one desired parameter of a patterned structure having a plurality of features defined by a certain process of its manufacturing, wherein the structure represents a grid having at least one cycle formed of at least two metal-containing regions spaced by substantially transparent regions with respect to incident light defining a waveguide. The method utilizes an optical model based on at least some of the features of the structure defined by a certain process of its manufacturing, and is capable of determining theoretical data representative of photometric intensities of light components of different wavelengths specularly reflected from the structure and of calculating said at least one desired parameter of the structure.
27 Citations
73 Claims
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1-26. -26. (cancel).
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27. A method of optical measurements on a patterned structure having an array of spaced-apart regions of different optical properties and having an uppermost layer of substantially uniform optical properties, the method comprising the steps of:
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a) providing an optical model, based on features of the structure, defined by a certain process of the structure manufacture, the optical model being configured for determining theoretical data representative of spectral characteristics of light returned from the structure and for calculating a thickness parameter of at least the uppermost layer of the structure;
b) applying optical measurements to said structure, by illuminating it with incident radiation of a preset substantially wide wavelength range, detecting light returned from the structure, and obtaining measured data representative of spectral characteristics of the measured returned light within said wavelength range;
c) processing and analyzing the measured data using said theoretical data, to determine a thickness of the uppermost layer of the structure under measurements in at least one region of the structure. - View Dependent Claims (28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50, 51, 52, 53, 54, 55, 56, 57, 58, 59, 60, 61, 62, 63, 64, 65, 66, 67, 68, 69, 70)
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71. An apparatus for optical measuring in a patterned structure having an array of spaced-apart regions of different optical properties and having an uppermost layer of substantially uniform optical properties, the apparatus comprising:
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a spectrometer for detecting a light response of the structure to incident light of a preset substantially wide wavelength range and for providing measured data representative of spectral characteristics of said light response within said wavelength range; and
a processor unit coupled to the spectrometer, the processor being operable for applying an optical model based on features of the structure, defined by a certain process of the structure manufacture, to determining theoretical data representative of spectral characteristics of light returned from the structure and for calculating a thickness parameter of at least the uppermost layer of the structure, and processing and analyzing said measured using the theoretical data and determining a thickness of the uppermost layer of the structure under measurements in at least one region of the structure. - View Dependent Claims (72, 73)
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Specification