Direct photo-patterning of nanoporous organosilicates, and method of use
First Claim
1. A method of forming patterned, porous material on a substrate, comprising:
- a. depositing a layer onto a substrate, said layer comprising a reactive organosilicate material, a porogen, an initiator, and a solvent;
b. exposing portions of the layer to radiation to change the solubility of portions of the organosilicate material with respect to the solvent;
c. selectively removing more soluble portions of the layer to generate a relief pattern; and
d. removing the porogen to thereby generate a porous organosilicate layer;
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Abstract
A low dielectric constant, patterned, nanoporous material and a method of forming the material. The material is formed by depositing a layer onto a substrate, said layer comprising a reactive organosilicate material, a porogen, an initiator, and a solvent; exposing portions of the layer to energy (e.g., thermal energy or electromagnetic radiation) to change the solubility of portions of the organosilicate material with respect to the solvent; selectively removing more soluble portions of the layer to generate a relief pattern; and decomposing the porogen to thereby generate a nanoporous organosilicate layer.
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Citations
26 Claims
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1. A method of forming patterned, porous material on a substrate, comprising:
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a. depositing a layer onto a substrate, said layer comprising a reactive organosilicate material, a porogen, an initiator, and a solvent;
b. exposing portions of the layer to radiation to change the solubility of portions of the organosilicate material with respect to the solvent;
c. selectively removing more soluble portions of the layer to generate a relief pattern; and
d. removing the porogen to thereby generate a porous organosilicate layer;
- View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24)
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25. A method of forming patterned, nanoporous material on a substrate, comprising:
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a. depositing a layer onto a substrate, said layer comprising;
(i) an organosilicate, (ii) a porogen as a template for forming pores within the organosilicate said porogen comprising a multiarm radial block copolymer having an amphiphilic structure with a core and a corona, one of the core and the corona being hydrophobic, and the other of the core and the corona being hydrophilic, (iii) an initiator, and (iv) a solvent;
b. exposing portions of the layer to radiation to change the solubility of portions of the organosilicate with respect to the solvent;
c. selectively removing more soluble portions of the layer to generate a relief pattern; and
d. removing the porogen to thereby generate a nanoporous layer. - View Dependent Claims (26)
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Specification