LOW OPERATING PRESSURE GAS SCRUBBER

• US 20050072299A1
• Filed: 10/06/2003
• Published: 04/07/2005
• Est. Priority Date: 10/06/2003
• Status: Active Grant

• Current Assignee: Paul E. Thomas
• Original Assignee: Paul E. Thomas
• Inventors: Thomas, Paul E.
• Granted Patent: US 6,893,484 B2
• Time in Patent Office: Days
• US Class Current: 95/226
• CPC Class Codes: B01D 2253/304 Linear dimensions, e.g. particle shape, diameter
• CPC Class Codes: B01D 47/021 by bubbling the gas through a liquid bath
• CPC Class Codes: B01D 53/1456 Removing acid components
• CPC Class Codes: B01D 53/18 Absorbing units; Liquid distributors therefor B01D3/16, B01D3/26, B01D3/30 take precedence; packing elements B01J19/30, B01J19/32

Abstract

Provided herein is an apparatus suitable for scrubbing either acidic or alkaline impurities from gas streams, wherein the gas streams to be scrubbed exist at a pressure which is only slightly higher than ambient pressure. An apparatus according to a preferred form of the invention exists substantially is the shape of a rectangular or cubic solid, having an inlet pipe which is directed to an inner chamber having a wall portion which functions as a manifold, comprising a plurality of gas conduction tubes in fluid contact with the inner chamber, and into which tubes the gas to be scrubbed enters. The gas to be scrubbed passes through holes in the walls of the gas conduction tubes and contacts a liquid absorbent substance present in the interior confines of the apparatus, which liquid is capable of reacting with one or more impurities in the gas stream, thus eliminating the impurities from the gas stream. The gas stream so treated emerges the apparatus through a gas outlet provision.

Claims

1. ) A device useful for scrubbing contaminants from gaseous streams comprising:

a) an enclosure comprising a bottom portion, a rear wall portion, a front wall portion, a left side wall portion and a right side wall portion, wherein said left side wall portion and said right side wall portion each include a hole disposed therethrough, one of said holes being a gas inlet and the remaining hole being a gas outlet; and

b) a gas manifold portion comprising;

i) a substantially vertically disposed plate portion, said plate portion having an upper end portion, a lower end portion, two side edge portions, and a plurality of holes disposed through it along its lower end portion,

ii) a plurality of gas conduction tubes coinciding with the number of plurality of holes disposed through said plate portion along its lower end portion, each of said gas conduction tubes having a top surface portion, a first open end portion and a second closed end portion, wherein said open end portion of each of said gas conduction tubes are affixed over said holes disposed through said plate portion, said gas conduction tubes each comprising a plurality of holes disposed along their lengths;

iii) a substantially horizontally disposed plate top portion having two end portions and two edge portions located at the upper end portion of the plate portion such that the angle of intersection the plate top portion makes with the plate portion is any angle between about 45 degrees and 135 degrees,

wherein said lower end portion of said plate portion is sealed along its length to said bottom portion of said enclosure, and wherein each of said side edge portions of said plate portion are sealed along each of their lengths to said front wall portion and said rear wall portion of said enclosure, respectively, and wherein each of said end portions of said plate top portion are sealed along their lengths to said front wall portion and said rear wall portion of said enclosure and wherein the edge portion of said plate top portion which does not intersect with said plate portion is sealed along its length to said left side wall portion of said enclosure, thus defining a sealed chamber defined by said plate portion, said plate top portion, a portion of said front wall portion of said enclosure, a portion of said rear wall portion of said enclosure, and a portion of said left side wall portion.

2. ) A device according to claim 1 wherein at least one of said right side wall, left side wall, front wall or rear wall portions include two holes disposed through it for charging and draining said device with a liquid absorbent substance.

3. ) A device according to claim 1 wherein said plurality of holes disposed through said plate portion at its lower end portion comprises any number of holes between about 2 and about 20.

4. ) A device according to claim 1 wherein said plurality of gas conduction tubes is any number between about 2 and about 20.

5. ) A device according to claim 1 wherein the plurality of holes disposed along the lengths of each of said gas conduction tubes comprises any number of holes between about 8 holes and about 16 holes for every 2.5 centimeters of length of said gas conduction tube.

6. ) A device according to claim 1 wherein each of the holes in said plurality of holes disposed along the lengths of each of said gas conduction tubes have a cross sectional area of any value in the range of between about 0.4 square centimeters to about 1.2 square centimeters.

7. ) A device according to claim 1 wherein each of the holes in said plurality of holes disposed along the lengths of each of said gas conduction tubes are round and have a diameter of any value in the range of between about 1.5 millimeters to about 4.5 millimeters.

8. ) A device according to claim 1 wherein the plurality of holes disposed along the lengths of each of said gas conduction tubes are disposed so that there are between about 8 holes and 16 holes for every 25 millimeters of length of said gas conduction tubes.

9. ) A device according to claim 1 having a length dimension between about 20 centimeters and about 200 centimeters, a width dimension between about 20 centimeters and about 200 centimeters, and a height dimension between about 1 centimeters and about 8 centimeters.

10. ) A device according to claim 1 further comprising a sheet of metal mesh disposed across substantially all of said top surface portion of said gas conduction tubes.

11. ) A device according to claim 10 further comprising a sheet of expanded metal disposed on the top of said sheet of metal mesh.

12. ) A device according to claim 11 further comprising a baffle means which comprises a sheet of metal mesh disposed between two sheets of expanded metal, wherein said baffle means is disposed above the top surface of the liquid absorbent substance 27 and wherein the top surface of the baffle means is below the lowest portion of the opening of said gas outlet.

13. ) A device according to claim 1 further comprising a liquid absorbent substance present within said enclosure, wherein the top surface of said liquid absorbent substance is above the top surface of said gas conduction tubes, and further comprising a baffle means which comprises a sheet of metal mesh disposed between two sheets of expanded metal, wherein said baffle means is disposed above the top surface of the liquid absorbent substance and wherein the top surface of the baffle means is below the lowest portion of the opening of said gas outlet.

14. ) A device according to claim 13 wherein the angle of intersection of the plate top portion and the plate portion is about 90 degrees.

15. ) A device according to claim 1 wherein the volume of said sealed chamber disposed within said enclosure is between about 4000 cubic centimeters and 800,000 cubic centimeters, excluding the volume contained in the gas conduction tubes.

16. ) A device according to claim 1 further comprising a liquid absorbent substance present within said enclosure, wherein the top surface of said liquid absorbent substance is above the top surface of said gas conduction tubes, but below the lowest portion of the opening of said gas outlet.

17. ) A device according to claim 1 further comprising a liquid absorbent substance present within said enclosure, wherein the liquid absorbent substance is disposed so that its top surface is above the top surface of said gas conduction tubes, and further comprising a baffle means which comprises a sheet of metal mesh disposed between and in contact with each of two sheets of expanded metal, and wherein the top surface of said liquid absorbent substance is below the bottom surface of said baffle means.

18. ) A device according to claim 16 wherein said liquid absorbent substance is selected from the group consisting of:

acidic liquids and alkaline liquids.

19. ) A device according to claim 18 wherein said liquid absorbent substance is alkaline and is selected from the group consisting of:

trizaine, alkanolamines, aqueous caustic soda, monoethanolamine, diethanolamine, and triethanolamine.

20. ) A process for scrubbing a gaseous substance having an undesired impurity present comprising the step of feeding said gaseous substance into said gas inlet of a device according to claim 16, wherein said gaseous substance is at a pressure of between about 0.1 psi and about 20 psi above the ambient pressure.

21. ) A process according to claim 20 wherein said impurity comprises hydrogen sulfide.

22. ) A process for scrubbing a gaseous substance having an undesired impurity present comprising the step of feeding said gaseous substance into said gas inlet of a device according to claim 17, wherein said gaseous substance is at a pressure of between about 0.1 psi and about 20 psi above the ambient pressure.

23. ) A process according to claim 22 wherein said impurity comprises hydrogen sulfide.

24. ) A process for scrubbing a gaseous substance having an undesired impurity present comprising the step of feeding said gaseous substance into said gas inlet of a device according to claim 18, wherein said gaseous substance is at a pressure of between about 0.1 psi and about 20 psi above the ambient pressure.

25. ) A process according to claim 24 wherein said impurity comprises hydrogen sulfide.

26. ) A process for scrubbing a gaseous substance having an undesired impurity present comprising the step of feeding said gaseous substance into said gas inlet of a device according to claim 19, wherein said gaseous substance is at a pressure of between about 0.1 psi and about 20 psi above the ambient pressure.

27. ) A process according to claim 20 wherein said impurity comprises hydrogen sulfide.