Single phase fluid imprint lithography method
First Claim
1. A method for reducing gases present in a layer of viscous liquid deposited on a substrate, said method comprising:
- varying a transport of said gases proximate to said viscous liquid to increase said transport of said gases in said viscous liquid.
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Accused Products
Abstract
The present invention is directed toward a method for reducing pattern distortions in imprinting layers by reducing gas pockets present in a layer of viscous liquid deposited on a substrate. To that end, the method includes varying a transport of the gases disposed proximate to the viscous liquid. Specifically, the atmosphere proximate to the substrate wherein a pattern is to be recorded is saturated with gases that are either highly soluble, highly diffusive, or both with respect to the viscous liquid being deposited. Additionally, or in lieu of saturating the atmosphere, the pressure of the atmosphere may be reduced.
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Citations
25 Claims
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1. A method for reducing gases present in a layer of viscous liquid deposited on a substrate, said method comprising:
varying a transport of said gases proximate to said viscous liquid to increase said transport of said gases in said viscous liquid. - View Dependent Claims (2, 4, 5)
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3. canceled
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9. A method for reducing gases present in a layer of viscous liquid deposited on a substrate, said method comprising:
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defining a processing region proximate to said substrate by placing a template in close proximity with said substrate, said processing region having an atmosphere associated therewith; and
varying characteristics of said atmosphere to increase a transport of gases in said atmosphere to said viscous liquid. - View Dependent Claims (10, 11, 12, 13)
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14. A method for reducing gases present in a layer of viscous liquid deposited on a substrate, said method comprising:
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placing a template in close proximity with said substrate, defining a processing region therebetween having an atmosphere associated therewith;
introducing a fluid into said atmosphere to increase a transport of said gases in said viscous liquid; and
reducing a pressure of said processing region by applying a vacuum to said processing region. - View Dependent Claims (15, 16, 17, 18)
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19. A method for reducing gases present in a layer of viscous liquid deposited on a substrate, said method comprising:
varying a composition of gases proximate to said viscous liquid to increase transport of said gases in said viscous liquid. - View Dependent Claims (20, 21, 22, 23, 24)
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25. The method as recited in claim 25 wherein introducing further includes introducing said fluid selected from a set of fluids consisting of carbon dioxide and helium.
Specification