METHODS AND SYSTEMS FOR CONTROLLING RADIATION BEAM CHARACTERISTICS FOR MICROLITHOGRAPHIC PROCESSING
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Accused Products
Abstract
Methods and apparatuses for controlling characteristics of radiation directed to a microlithographic workpiece are disclosed. An apparatus in accordance with one embodiment of the invention includes a source of radiation positioned to direct a radiation beam having an amplitude distribution, a phase distribution, and a polarization distribution, toward a workpiece. An adaptive structure can be positioned in a path of the radiation beam and can have a plurality of independently controllable and selectively radiation transmissible elements, each configured to change at least one of the amplitude distribution, the phase distribution and the polarization distribution of the radiation beam. A controller can be operatively coupled to the adaptive structure to direct the elements of the adaptive structure to change from one state to any of a plurality of available other states. Accordingly, the adaptive structure can provide radiation beams having a variety of continuously variable distributions for a variety of radiation beam characteristics.
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Citations
49 Claims
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1. (canceled)
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6. An apparatus for controlling characteristics of radiation directed to a microlithographic workpiece comprising:
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a workpiece support having a support surface positioned to carry a microlithographic workpiece;
a source of radiation positioned to direct a radiation beam along a radiation path toward the workpiece support the radiation beam having an amplitude distribution a phase distribution and a polarization distribution;
an adaptive structure positioned in the radiation path between the source of radiation and the workpiece support the adaptive structure having a plurality of independently controllable and selectively radiation transmissible elements, each configured to receive a portion of the radiation beam and change from one state to any of a plurality of available other states to change at least one of the amplitude distribution, the phase distribution and the polarization distribution of the radiation beam;
a reticle disposed between the adaptive structure and the workpiece support and a controller operatively coupled to the adaptive structure to direct the elements of the adaptive structure to change from the one state to the one of the Plurality of other states. - View Dependent Claims (2, 3, 4, 5, 7, 8, 9, 10)
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11. An apparatus for controlling characteristics of radiation directed to a microlithographic workpiece, comprising:
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a workpiece support having a support surface positioned to carry a microlithographic workpiece;
a source of radiation positioned to direct a radiation beam along a radiation path toward the workpiece support, the radiation beam having a phase distribution and a polarization distribution;
an adaptive structure positioned in the radiation path between the source of radiation and the workpiece support, the adaptive structure having a plurality of independently controllable elements, each configured to receive a portion of the radiation beam and change from one state to any of a plurality of available other states to change at least one of the phase distribution and the polarization distribution of the radiation beam;
a reticle disposed between the adaptive structure and the workpiece support; and
a controller operatively coupled to the adaptive structure to direct the elements of the adaptive structure to change from the one state to the one of the plurality of other states. - View Dependent Claims (12, 13, 14, 15)
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16. (canceled)
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21. An apparatus for controlling characteristics of radiation directed to a microlithographic workpiece, comprising:
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a workpiece support having a support surface positioned to carry a microlithographic workpiece;
a source of radiation positioned to direct a radiation beam along a radiation path toward the workpiece support, the radiation beam having an amplitude distribution, a phase distribution and a polarization distribution;
an adaptive structure positioned in the radiation path between the source of radiation and the workpiece support, the adaptive structure being configured to receive the radiation beam and independently change any two of the amplitude distribution the phase distribution and the polarization distribution of the radiation beam; and
a reticle disposed between the adaptive structure and the workpiece support, and a controller operatively coupled to the adaptive structure to direct the adaptive structure to change from one state to another state. - View Dependent Claims (17, 18, 19, 20, 22, 23, 24, 25, 26)
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27. An apparatus for controlling characteristics of radiation directed to a microlithographic workpiece, comprising:
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a workpiece support having a support surface positioned to carry a microlithographic workpiece;
a source of radiation positioned to direct a radiation beam along a radiation path toward the workpiece support, the radiation beam having an amplitude distribution, a phase distribution and a polarization distribution in a plane generally transverse to the radiation path;
an adaptive structure positioned in the radiation path between the source of radiation and the workpiece support, the adaptive structure to receive the radiation beam and change from one state to any of a plurality of available other states to independently change each of the amplitude distribution, the phase distribution and the polarization distribution from a first distribution to a second distribution, with each second distribution selected from a generally continuous spectrum of second distributions;
a controller electrically coupled to the adaptive structure to direct electrical signals to the adaptive structure to change the state of the adaptive structure; and
a reticle positioned between the adaptive structure and the workpiece support, with at least one of the reticle and the workpiece support being movable relative to the other. - View Dependent Claims (28, 29)
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30. (canceled)
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35. A method for controlling characteristics of radiation directed to a microlithographic workpiece, comprising:
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directing a radiation beam from a radiation source along a radiation path, the radiation beam having an amplitude distribution, a phase distribution and a polarization distribution as a function of location in a plane generally transverse to the radiation path;
impinging the radiation beam on an adaptive structure positioned in the radiation path;
changing a state of at least one element of the adaptive structure from one state to any of a plurality of available other states to change at least one of the amplitude distribution, the phase distribution and the polarization distribution;
passing the radiation beam through and away from the at least one element of the adaptive structure;
passing the radiation beam through a reticle positioned between the adaptive structure and the microlithographic workpiece; and
impinging the radiation beam directed away from the adaptive structure on the microlithographic workpiece. - View Dependent Claims (31, 32, 33, 34, 36)
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37. A method for controlling characteristics of radiation directed to a microlithographic workpiece, comprising:
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directing a radiation beam from a radiation source along a radiation path, the radiation beam having a phase distribution and a polarization distribution as a function of location in a plane generally transverse to the radiation path;
impinging the radiation beam on an adaptive structure positioned in the radiation path;
changing a state of at least one element of the adaptive structure from one state to any of a plurality of available other states to change at least one of the phase distribution and the polarization distribution;
directing the radiation beam away from the at least one element of the adaptive structure;
passing the radiation beam through a reticle positioned between the adaptive structure and the microlithographic workpiece; and
impinging the radiation beam directed away from the adaptive structure on the microlithographic workpiece. - View Dependent Claims (38, 39, 40)
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41. (canceled)
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47. A method for controlling characteristics of radiation directed to a microlithographic workpiece, comprising:
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directing a radiation beam from a radiation source along a radiation path the radiation beam having an amplitude distribution a phase distribution, and a polarization distribution as a function of location in a plane generally transverse to the radiation path;
impinging the radiation beam on an adaptive structure positioned in the radiation path;
changing a state of each of at least two independently controllable elements of the adaptive structure from one state to another state to independently change at least two of the amplitude distribution, the phase distribution and the polarization distribution;
directing the radiation beam away from the adaptive structure along the radiation path;
passing the radiation beam through a reticle positioned between the adaptive structure and the microlithographic workpiece; and
impinging the radiation beam directed away from the adaptive structure on the microlithographic workpiece. - View Dependent Claims (42, 43, 44, 45, 46)
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48. A method for controlling characteristics of radiation directed to a microlithographic workpiece, comprising:
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directing a radiation beam from a radiation source along a radiation path, the radiation beam having a first amplitude distribution, a first phase distribution and a first polarization distribution as a function of location in a plane generally transverse to the radiation path;
impinging the radiation beam on an adaptive structure positioned in the radiation path;
changing a state of each of a plurality of adaptive elements of the adaptive structure from one state to any of a plurality of available other states to change the first amplitude distribution to a second amplitude distribution, change the first phase distribution to a second phase distribution, and change the first polarization distribution to a second polarization distribution, with each change being independent of the other two;
directing the radiation beam through and away from the adaptive structure along the radiation path;
passing the radiation beam through a reticle positioned between the adaptive structure and the microlithographic workpiece; and
impinging the radiation beam directed away from the adaptive structure on the microlithographic workpiece. - View Dependent Claims (49)
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Specification