X-ray crystal orientation measuring method and X-ray crystal orientation measuring apparatus

• US 20050078790A1
• Filed: 09/14/2004
• Published: 04/14/2005
• Est. Priority Date: 10/14/2003
• Status: Active Grant

• Current Assignee: Rigaku Corporation
• Original Assignee: Rigaku Corporation
• Inventors: Usui, Makoto, Kikuchi, Tetsuo, Inago, Yoshio, Uematsu, Toshio
• Granted Patent: US 7,158,609 B2
• Time in Patent Office: Days
• US Class Current: 378/73
• CPC Class Codes: G01N 23/205 using diffraction cameras

Abstract

An X-ray crystal orientation measuring apparatus and a method thereof, for enabling to measure distribution of crystal orientations upon a crystal having the sub-grain structure, lineage structure, other than the single domain, with using X-ray, comprises, an XY stage 20 for mounting a crystal S to be measured thereon and being movable in X-Y directions, an X-ray generating device 50 for irradiating X-ray at a predetermined angle upon a measuring surface of the crystal to be measured on the stage, a high-sensitive two-dimensional detector 60 for detecting the diffraction image (i.e., the Laue image) of X-ray, which is irradiated from the X-ray generating device upon the measuring surface of the crystal to be measured, and a control PC (CPU) 90, wherein the control PC calculates out a central position of the diffraction image detected, from the detected screen, so as to calculate out the crystal orientation upon the measuring surface of the crystal to be measured, and thereby enabling the measurement of the crystal orientation within a short time, even if conducing mapping measurement at a large number of points thereon.

Claims

1. An X-ray crystal orientation measuring method, comprising the following steps of:

irradiating continuous X-rays upon a measuring surface of a crystal to be measured at a predetermined angle;

detecting spots obtained through irradiation of said continuous X-rays, corresponding to a lattice plane of the crystal, by means of a two-dimension detector; and

measuring a central position of said detected spots, whereby calculating out a normal line of the lattice plane of said crystal upon basis of said central point measured.

2. The X-ray crystal orientation measuring method, as described in the claim 1, wherein the measurement in accordance with the measuring method mentioned above is executed at plural numbers of portions upon the measuring surface of the crystal to be measured, whereby measuring a distribution of orientations on the measuring surface of said crystal.

3. The X-ray crystal orientation measuring method, as described in the claim 1, wherein the spots obtained through irradiation of said continuous X-rays upon the measuring surface of said crystal to be measured are Laue spots.

4. An X-ray crystal orientation measuring apparatus, for measuring a crystal orientation upon a measuring surface of a crystal to be measured, with using X-ray, comprising:

a sample mounting means for mounting a crystal to be measured thereon, being movable in a horizontal direction;

means for irradiating X-ray at a predetermined angle upon the measuring surface of said crystal to be measured, which is mounted on said sample mounting means;

means for detecting a diffraction image of the X-ray irradiated from said X-ray irradiating means upon the measuring surface of said crystal to be measured; and

means for calculating out the crystal orientation upon the measuring surface of said crystal to be measured, from the diffraction image detected by said detection means.

5. The X-ray crystal orientation measuring apparatus, as described in the claim 4, wherein said calculating means calculates out a center point of the diffraction image detected by said detection means, whereby calculating out the crystal orientation upon the measuring surface of said crystal to be measured.

6. The X-ray crystal orientation measuring apparatus, as described in the claim 5, wherein the spots detected by said detection means are Laue spots.

7. The X-ray crystal orientation measuring apparatus, as described in the claim 4, wherein said detection means is movable in a part thereof, whereby brining a camera length thereof to be adjustable.

8. The X-ray crystal orientation measuring apparatus, as described in the claim 4, wherein said X-ray irradiation means and said detection means are attached, so that an irradiation direction of the X-ray and an incident direction thereof are equal to each other with respect to the measuring surface of said crystal to be measured.

9. The X-ray crystal orientation measuring apparatus, as described in the claim 4, wherein said X-ray irradiation means and said detection means are movable in direction of a normal line to the measuring surface of said crystal to be measured, which is mounted on said sample mounting means.