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CMOS image sensor and manufacturing method thereof

  • US 20050082627A1
  • Filed: 09/30/2004
  • Published: 04/21/2005
  • Est. Priority Date: 10/01/2003
  • Status: Active Grant
First Claim
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1. A CMOS image sensor comprising:

  • a substrate having a light receiving region;

    an interlayer insulating film formed on the substrate;

    a plurality of metal wirings formed on the interlayer insulating film so as to expose the light receiving region;

    a protection layer coated on the metal wirings and the interlayer insulating film; and

    a plurality of color filters formed on the protection layer, wherein at least one of the color filters is provided with an isolation layer formed on an upper surface thereof.

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