Lithographic apparatus, device manufacturing method, and slide assembly

• US 20050083508A1
• Filed: 08/26/2004
• Published: 04/21/2005
• Est. Priority Date: 08/27/2003
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Hage, Edward
• Granted Patent: US 7,265,817 B2
• Time in Patent Office: Days
• US Class Current: 355/72
• CPC Class Codes: G03F 7/70816 Bearings

Abstract

The invention relates to a lithographic apparatus which includes a slide assembly, having a base, which base has a running surface, a slide member adapted to move over the running surface, and a bearing system configured to create a distance between the slide member and the running surface. The bearing system includes a first force generating device configured to provide a first force in a first direction, the first direction being substantially perpendicular to the running surface, and a second force generating device configured to provide a second force in a second direction, the second force being opposite to the first direction. The first and second force generating devices are adapted to co-operate in establishing the distance between the slide member and the running surface. The second force generating device includes a plurality of force generating elements defining an area between them, in which area the first force generating device is arranged.

Claims

1. A slide assembly comprising:

a base including a running surface,

a slide member configured to move over the running surface, and

a bearing system configured to create a distance between the slide member and the running surface, the bearing system comprising;

(a) a first force generating device configured to provide a first force in a first direction, said first direction being at least substantially perpendicular to the running surface, and

(b) a second force generating device configured to provide a second force in a second direction, said second direction being opposite to the first direction, the first force generating device and second force generating device being adapted to co-operate in establishing the distance between the slide member and the running surface,

wherein the second force generating device comprises a plurality of force generating elements, said plurality of force generating elements defining an area between them in which the first force generating device is arranged.

19. The slide assembly of claim 1, wherein the second force generating device encompasses the first force generating device.

20. The slide assembly of claim 1, wherein the second force generating device comprises an air bearing system configured to provide a repelling force.

21. The slide assembly of claim 1, wherein the first force generating device comprises a magnetically active system configured to provide a magnetic attraction force.

22. The slide assembly of claim 1, wherein the first force generating device comprises a suction system configured to create at least partial vacuum to create an attraction force.

23. The slide assembly of claim 1, wherein the bearing system comprises:

an air bearing including an array of holes to let out pressurized gas, said air bearing being configured to provide a repelling force between the slide member and the surface over which the slide member is configured to move, and

an array of magnetic bodies,

wherein the running surface comprises a metal counter plate configured to close the magnetic flux lines of the magnetic bodies, such that an attracting force between the slide member and the running surface is created.

24. The lithographic apparatus of claim 23, wherein the bearing system includes a metal back plate, adjoining the magnetic bodies at their side facing away from the surface, said metal back plate being configured to close the magnetic flux lines on said side, the magnetic bodies and the back plate being arranged in a casing of ceramic material.

25. The lithographic apparatus of claim 23, wherein the magnetic bodies are arranged in a metal casing, said metal casing being configured to close the magnetic flux lines on the side of the magnetic bodies facing away from the surface.

2. A lithographic apparatus comprising:

an illumination system configured to condition a beam of radiation;

a support structure configured to support a patterning device, the patterning device configured to impart the beam of radiation with a pattern in its cross section;

a substrate table configured to hold a substrate;

a projection system configured to project the patterned beam of radiation onto a target portion of the substrate; and

a slide assembly comprising

(a) a base including a running surface,

(b) a slide member configured to move over the running surface, and

(c) a bearing system configured to create a distance between the slide member and the running surface, the bearing system comprising;

(i) a first force generating device configured to provide a first force in a first direction, said first direction being at least substantially perpendicular to the running surface, and

(ii) a second force generating device configured to provide a second force in a second direction, said second direction being opposite to the first direction, the first force generating device and second force generating device being adapted to co-operate in establishing the distance between the slide member and the running surface,

wherein the second force generating device includes a plurality of force generating elements, said plurality of force generating elements defining an area between them in which the first force generating device is arranged.

3. The lithographic apparatus of claim 2, wherein the second force generating device encompasses the first force generating device.

4. The lithographic apparatus of claim 2, wherein the second force generating device comprises air bearing system configured to provide a repelling force.

5. The lithographic apparatus of claim 2, wherein the first force generating device comprises a magnetically active system configured to provide a magnetic attraction force.

6. The lithographic apparatus of claim 2, wherein the first force generating device comprises a suction system configured to create at least partial vacuum to create an attraction force.

7. The lithographic apparatus of claim 2, wherein the slide member comprises:

an air bearing including an array of holes to let out pressurized gas, said air bearing being configured to provide a repelling force between the slide member and the surface over which the slide member is configured to move, and

an array of magnetic bodies,

wherein the running surface comprises a metal counter plate configured to close the magnetic flux lines of the magnetic bodies, such that an attracting force between the slide member and the running surface is created.

8. The lithographic apparatus of claim 7, wherein the bearing system includes a metal back plate, adjoining the magnetic bodies at their side facing away from the surface, said metal back plate being configured to close the magnetic flux lines on said side, the magnetic bodies and the back plate being arranged in a casing of ceramic material.

9. The lithographic apparatus of claim 7, wherein the magnetic bodies are arranged in a metal casing, said metal casing being configured to close the magnetic flux lines on the side of the magnetic bodies facing away from the surface.

10. A device manufacturing method comprising:

providing a beam of radiation;

patterning the beam of radiation with a pattern in its cross-section;

projecting the patterned beam of radiation onto a target portion of the layer of radiation-sensitive material;

creating a distance between a running surface of a base and a slide member which carries an object, to allow movement of the slide member over the running surface using a bearing system,

wherein the bearing system comprises a first force generating device configured to provide a first force in a first direction, said first direction being substantially perpendicular to the running surface, and a second force generating device configured to provide a second force in a second direction, said second direction being opposite to the first direction, the first force generating device and the second force generating device being adapted to co-operate in establishing the distance between the slide member and the running surface, and

wherein the second force generating device comprises a plurality of force generating elements, said force generating elements defining an area between them, in which area the first force generating device is arranged.

11. A bearing system configured to support a slide member over a running surface of a base, comprising:

a first force generating device configured to provide a first force in a first direction, said first direction being substantially perpendicular to said running surface; and

a second force generating device configured to provide a second force in a second direction, said second direction being opposite to the first direction,

wherein the first and second force generating devices are arranged in the slide member such that an action line of the first force substantially coincides with an action line of the second force.

12. The bearing system of claim 11, wherein the second force generating device includes a plurality of force generating elements surrounding said first force generating device.

13. The bearing system of claim 12, wherein said plurality of force generating elements are located at a substantially equal distance from an outside contour of said first force generating device.

14. The bearing system of claim 11, wherein said first force generating device includes an array of magnets configured to generate said first force.

15. The bearing system of claim 14, further comprising a metal plate arranged in the slide member and configured to close magnetic lines generated by said array of magnets.

16. The bearing system of claim 11, wherein said first and second force generating devices are housed in a ceramic casing.

17. The bearing system of claim 11, wherein a bending moment induced by each of said first and second force generating devices on said slide member is substantially zero.

18. The bearing system of claim 11, wherein said second force generating device is an air bearing.

26. A device manufacturing method comprising:

patterning a beam of radiation with a pattern in its cross-section;

projecting the patterned beam of radiation onto a target portion of a substrate; and

supporting a slide member over a running surface of a base, the supporting comprising;

applying a first force onto said running surface, said first force being substantially perpendicular to said running surface;

applying a second force onto said slide member, said second force being opposite to said first force,

wherein said first force and said second force act to space apart the slide member from the running surface and are directed such that a bending moment induced by each of said first and second force on said slide member is substantially zero.

27. The device manufacturing method of claim 26, wherein said slide member is configured to support at least a patterning device or a substrate.

28. A device manufacturing method comprising:

patterning a beam of radiation with a pattern in its cross-section;

projecting the patterned beam of radiation onto a target portion of a substrate; and

supporting a slide member over a running surface of a base, the supporting comprising;

applying a first force onto said running surface, said first force being substantially perpendicular to said running surface;

applying a second force onto said slide member, said second force being opposite to said first force,

wherein a line of action of said first force substantially coincides with a line of action of said second force such that said first and second force act to space apart the slide member from the running surface.