Electrode structural body

• US 20050085887A1
• Filed: 02/19/2003
• Published: 04/21/2005
• Est. Priority Date: 02/22/2002
• Status: Abandoned Application

• Current Assignee: Hisamitsu Pharmaceutical Company Incorporated, Kyodo Printing Company Limited
• Original Assignee: Hisamitsu Pharmaceutical Company Incorporated, Kyodo Printing Company Limited
• Inventors: Arimoto, Tetsuya, Nishi, Yoshihiro, Higo, Naruhito, Ogawa, Tatsuya, Mori, Kenji, Fuchita, Yasushi, Sato, Shuji, Maeda, Hiroyuki, Takahashi, Saori
• Application Number:
  US10/505,158
• Publication Number:
  US 20050085887A1
• Time in Patent Office: Days
• US Class Current: 607/142
• CPC Class Codes: A61N 1/0424 Shape of the electrode
• CPC Class Codes: A61N 1/044 Shape of the electrode

Abstract

There is provided an electrode structure in which cracks are hardly generated in the bending processed portions, in particular, in the electrode layer and the insulating layer. The electrode structure comprises a support (3) having bending processed portions (4), an electrode layer (1) formed on the support so as to pass over the bending processed portions (4), and an insulating layer (2) formed on the electrode layer (1) passing over the bending processed portions (4). The glass transition temperature of the dielectric material forming the insulating layer (2) is made to be 25° C. or below. The electrode layer (1) includes at least one material belonging to the group consisting of silver, silver chloride and carbon, and in particular, a terminal portion (5) of the electrode layer (1) passing over the bending processed portions (4) is formed of a paste containing carbon as the main component.

Claims

1. An electrode structure comprising a support having bending processed portions, an electrode layer formed on the support so as to pass over the bending processed portions, and an insulating layer formed on the electrode layer passing over the bending processed portions, wherein the glass transition temperature of at least one dielectric material of the dielectric materials forming the insulating layer is 25°

C. or below.

2. The electrode structure according to claim 1, whrein the thickness of the insulating layer is 0.5 μ

m to 100 μ

m.

3. The electrode structure according to claim 1, wherein the support is formed with a polyethylene terephthalate film or an insulating base formed with an aluminum foil coated or laminated with an insulating film.

4. The electrode structure according to claim 1, the electrode layer comprises at least one material belonging to the group consisting of silver, silver chloride and carbon.

5. The electrode structure according to claim 1, wherein the portions of the electrode layer passing over the bending processed portions are formed of a paste which contains carbon as the main component.

6. The electrode structure according to claim 1, wherein the interior angles and the conjugate angles of the bending processed portions are 90 degrees to 270 degrees.

9. The electrode structure according to claim 2, wherein the support is formed with a polyethylene terephthalate film or an insulating base formed with an aluminum foil coated or laminated with an insulating film.

10. The electrode structure according to claim 2, the electrode layer comprises at least one material belonging to the group consisting of silver, silver chloride and carbon.

11. The electrode structure according to claim 3, the electrode layer comprises at least one material belonging to the group consisting of silver, silver chloride and carbon.

12. The electrode structure according to claim 2, wherein the portions of the electrode layer passing over the bending processed portions are formed of a paste which contains carbon as the main component.

13. The electrode structure according to claim 3, wherein the portions of the electrode layer passing over the bending processed portions are formed of a paste which contains carbon as the main component.

14. The electrode structure according to claim 4, wherein the portions of the electrode layer passing over the bending processed portions are formed of a paste which contains carbon as the main component.

15. The electrode structure according to claim 2, wherein the interior angles and the conjugate angles of the bending processed portions are 90 degrees to 270 degrees.

16. The electrode structure according to claim 3, wherein the interior angles and the conjugate angles of the bending processed portions are 90 degrees to 270 degrees.

17. The electrode structure according to claim 4, wherein the interior angles and the conjugate angles of the bending processed portions are 90 degrees to 270 degrees.

18. The electrode structure according to claim 5, wherein the interior angles and the conjugate angles of the bending processed portions are 90 degrees to 270 degrees.

7. A method for manufactyuring an electrode structure, comprising the steps of:

forming an electrode layer having a terminal portion on a support;

forming an insulating layer, which includes a dielectric material having glass transition temperature of 25°

C. or below, on the terminal portion of the electrode layer; and

performing a bending process of specific portions of the support including the insulating layer.

8. The method for manufacturing the electrode structure according to claim 7, wherein the insulating layer is formed by a screen printing.