Plasma processing apparatus and method for stabilizing inner wall of processing chamber
First Claim
1. A plasma processing apparatus for subjecting an object to be processed to vacuum processing by introducing processing gas into a processing chamber and generating plasma, the apparatus comprising:
- a plasma generating means;
a monitor means for detecting the existence of a reaction product containing a material constituting an inner wall of the processing chamber; and
an alarm means for notifying that the existence of the reaction product containing the material constituting the inner wall of the processing chamber has exceeded a predetermined amount.
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Accused Products
Abstract
The invention aims at providing a plasma processing apparatus capable of removing the deposition film in the processing chamber and suppressing the corrosion of wall surface material. The plasma processing apparatus for subjecting an object to be processed to vacuum processing by introducing a processing gas into a processing chamber 101 and generating plasma 110 comprises plasma generating means 106 through 108, a monitor means 112 for detecting the existence of a reaction product containing a material constituting an inner wall 102 of the processing chamber, and an alarm means for notifying that the existence of the reaction product containing the material constituting the inner wall 102 of the processing chamber has exceeded a predetermined amount, wherein a plasma cleaning is performed for every arbitrary etching process, and a wall surface stabilization process is subsequently performed using O2 gas or F gas.
9 Citations
9 Claims
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1. A plasma processing apparatus for subjecting an object to be processed to vacuum processing by introducing processing gas into a processing chamber and generating plasma, the apparatus comprising:
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a plasma generating means;
a monitor means for detecting the existence of a reaction product containing a material constituting an inner wall of the processing chamber; and
an alarm means for notifying that the existence of the reaction product containing the material constituting the inner wall of the processing chamber has exceeded a predetermined amount. - View Dependent Claims (2, 3, 4, 8, 9)
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5. A plasma processing apparatus for subjecting an object to be processed to vacuum processing by introducing processing gas into a processing chamber in which the object is placed and generating plasma, the apparatus comprising:
a function for setting up an etching step, a plasma cleaning step, and a wall surface stabilization step for protecting an inner wall of the processing chamber, wherein the order and frequency of each step can be set arbitrarily.
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6. A method for stabilizing an inner wall surface of a processing chamber in a plasma processing apparatus for subjecting an object to be processed to vacuum processing by introducing processing gas into the processing chamber in which the object is placed and generating plasma, the method comprising:
after performing a plasma cleaning process in succession to an etching process, a wall surface stabilization process is performed in which an inner wall protection gas for protecting the inner wall surface of the processing chamber is introduced and plasma processing is performed. - View Dependent Claims (7)
Specification