System and method for run-time integration of an inset geometry into a background geometry

• US 20050088456A1
• Filed: 11/01/2004
• Published: 04/28/2005
• Est. Priority Date: 10/09/2002
• Status: Abandoned Application

• Current Assignee: Evans & Sutherland Computer Corp. (Elevate Entertainment, Inc.)
• Original Assignee: Evans & Sutherland Computer Corp. (Elevate Entertainment, Inc.)
• Inventors: Cosman, Michael A.
• Application Number:
  US10/979,892
• Publication Number:
  US 20050088456A1
• Time in Patent Office: Days
• US Class Current: 345/620
• CPC Class Codes: G06T 17/20 Finite element generation, e.g. wire-frame surface description, tesselation
• CPC Class Codes: G06T 19/20 Editing of 3D images, e.g. changing shapes or colours, aligning objects or positioning parts
• CPC Class Codes: G06T 2219/2021 Shape modification

Abstract

The invention provides a method for integrating an inset geometry within a background geometry. The method comprises the step of identifying a perimeter of the inset geometry. A further step is extending a skirt, having an outer perimeter and an inner perimeter, from the perimeter of the inset geometry out over the background geometry. An additional step is removing portions of the background geometry that are covered by the inset geometry and skirt. Another step is modifying the skirt so that the outer perimeter of the skirt matches background geometry behavior and the inner perimeter matches inset geometry behavior and a continuous transition exists between the outer perimeter and the inner perimeter.

Claims

1. A method for integrating an inset geometry within a background geometry, comprising:

identifying a perimeter of the inset geometry;

extending a skirt, having an outer perimeter and an inner perimeter, from the perimeter of the inset geometry out over the background geometry;

removing portions of the background geometry that are covered by the inset geometry and skirt;

modifying the skirt so that the outer perimeter of the skirt matches background geometry behavior and the inner perimeter matches inset geometry behavior and a continuous transition exists between the outer perimeter and the inner perimeter.

2. A method as in claim 1, further comprising the step of providing additional geometric constructs below the nominal surface of the skirt and inset geometry to conceal gaps between the skirt and inset geometry.

3. A method as in claim 2, wherein the step of providing additional geometric constructs further comprises the step of providing a first polygon wall having shared top vertices with the perimeter of the inset geometry and located beneath the surface of the inset geometry, where bottom vertices of the first polygon wall are shifted outward from the inset geometry.

4. A method as in claim 3, wherein the step of providing additional geometric constructs further comprises the step of providing a second polygon wall with top vertices shared with the polygon skirt and the bottom vertices shifted inward toward the inset geometry, whereby any gaps are concealed between the inset geometry and the background geometry during display.

5-32. -32. (canceled)