Process monitoring device for sample processing apparatus and control method of sample processing apparatus

• US 20050090914A1
• Filed: 11/15/2004
• Published: 04/28/2005
• Est. Priority Date: 03/05/2001
• Status: Active Grant

• Current Assignee: Hideyuki Yamamoto, Hiroyuki Kitsunai, Junichi Tanaka, Kazue Takahashi, Shoji Ikuhara
• Original Assignee: Hideyuki Yamamoto, Hiroyuki Kitsunai, Junichi Tanaka, Kazue Takahashi, Shoji Ikuhara
• Inventors: Tanaka, Junichi, Ikuhara, Shoji, Yamamoto, Hideyuki, Takahashi, Kazue, Kitsunai, Hiroyuki
• Granted Patent: US 7,058,467 B2
• Time in Patent Office: Days
• US Class Current: 700/83
• CPC Class Codes: G05B 19/41875 characterised by quality surveillance of production
• CPC Class Codes: G05B 21/02 electric
• CPC Class Codes: G05B 2219/32053 Adjust work parameter as function of other cell
• CPC Class Codes: G05B 2219/32182 If state of tool, product deviates from standard, adjust system, feedback
• CPC Class Codes: G05B 23/0221 Preprocessing measurements, e.g. data collection rate adjustment; Standardization of measurements; Time series or signal analysis, e.g. frequency analysis or wavelets; Trustworthiness of measurements; Indexes therefor; Measurements using easily measured parameters to estimate parameters difficult to measure; Virtual sensor creation; De-noising; Sensor fusion; Unconventional preprocessing inherently present in specific fault detection methods like PCA-based methods
• CPC Class Codes: Y02P 90/02 Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]

Abstract

A monitor data acquisition section acquires a plurality of monitor data relating to a processing state of one sample in a processing apparatus, via sensors. A data selection section selects monitor data belonging to an arbitrary processing division included in a plurality of processing divisions for the sample, from among the plurality of monitor data. A monitoring signal generation section generates monitoring signals based on the monitor data belonging to the arbitrary processing division selected by the data selection section. A display setting controller displays a plurality of monitoring signals obtained with respect to samples processed in the processing apparatus, on a display section in a time series manner.

Claims

1. (canceled)

2. A plasma processing apparatus for processing a sample within a vacuum vessel, comprising:

a plurality of sensors for detecting plural kinds of information relating to a processing state of the sample as monitor data;

data selecting means for selecting a detection time range of the monitor data thus detected which is used for monitoring the plasma processing apparatus;

a signal filter for converting the monitor data within the selected detection time range into an mount of an effective signal;

a model expression unit for generating a patterned shape predicted value based on the effective signal; and

a display screen for displaying the patterned shape predicted value;

wherein the display screen displays the patterned shape predicted value without measuring a patterned shape after processing of the sample.

3. A plasma processing apparatus for processing a sample within a vacuum vessel, comprising:

a plurality of sensors for detecting plural kinds of information relating to a processing state of the sample as monitor data;

data selecting means for selecting a detection time range of the monitor data thus detected which is used for monitoring the plasma processing apparatus;

a signal filter for converting the monitor data within the selected detection time range into an mount of an effective signal;

an apparatus monitoring signal generation section for generating an apparatus monitoring signal based on the effective signal;

a processing performance prediction section for predicting a processing performance based on the apparatus monitoring signal; and

a processing parameter modification quantity calculation section for calculating a correction quantity of a processing parameter for removing a deviation of a predicted value of the processing performance predicted by the processing performance prediction section from a standard value so as to control the processing parameter.