Methods of enhancing selectivity of etching silicon dioxide relative to one or more organic substances; and plasma reaction chambers

• US 20050101150A1
• Filed: 12/10/2004
• Published: 05/12/2005
• Est. Priority Date: 08/31/2000
• Status: Active Grant

• Current Assignee: Li Li, Max F. Hineman
• Original Assignee: Li Li, Max F. Hineman
• Inventors: Li, Li, Hineman, Max F.
• Granted Patent: US 7,293,526 B2
• Time in Patent Office: Days
• US Class Current: 438/723
• CPC Class Codes: H01J 37/32623 Mechanical discharge control means
• CPC Class Codes: H01J 37/32633 Baffles
• CPC Class Codes: H01L 21/31116 by dry-etching
• CPC Class Codes: H01L 28/65 comprising a noble metal or a noble metal oxide, e.g. platinum (Pt), ruthenium (Ru), ruthenium dioxide (RuO2), iridium (Ir), iridium dioxide (IrO2)
• CPC Class Codes: Y10S 156/916 Differential etching apparatus including chamber cleaning means or shield for preventing deposits
• CPC Class Codes: Y10S 438/909 Controlled atmosphere

Abstract

The invention encompasses a method of enhancing selectivity of etching silicon dioxide relative to one or more organic substances. A material comprising one or more elements selected from Group VIII of the periodic table is provided within a reaction chamber; and a substrate is provided within the reaction chamber. The substrate has both a silicon-oxide-containing composition and at least one organic substance thereover. The silicon-oxide-containing composition is plasma etched within the reaction chamber. The plasma etching of the silicon-oxide-containing composition has increased selectivity for the silicon oxide of the composition relative to the at least one organic substance than would plasma etching conducted without the material in the chamber. The invention also encompasses a plasma reaction chamber assembly. The assembly comprises at least one interior wall, and at least one liner along the at least one interior wall. The liner comprises one or more of Ru, Fe, Co, Ni, Rh, Pd, Os, W, Ir, Pt and Ti.

Claims

1-120. -120. (canceled)

121. A plasma reaction chamber having a liner comprising one or more elements selected from Group VIII of the periodic table, wherein the plasma reaction chamber comprises at least one interior wall and the liner is proximate the interior wall.

122. The reaction chamber of claim 121 wherein the liner is physically against the interior wall.

123. The reaction chamber of claim 121 wherein the interior wall comprises alumina.

124. The reaction chamber of claim 121 further comprising a focusing ring within the chamber.

125. The reaction chamber of claim 121 wherein the reaction chamber is a circular construction having a continuous interior wall.

126. The reaction chamber of claim 125 wherein the liner comprises a cylindrical shape configured to slip within the interior wall of the reaction chamber.

127. The reaction chamber of claim 121 wherein the liner comprises one or more of Co, Ni, Rh, Pd, Os, W, Ir, Pt, and Ti.

128. The reaction chamber of claim 121 wherein the liner comprises Co.

129. The reaction chamber of claim 121 wherein the liner comprises Ni.

130. The reaction chamber of claim 121 wherein the liner comprises Rh.

131. The reaction chamber of claim 121 wherein the liner comprises Pd.

132. The reaction chamber of claim 121 wherein the liner comprises Os.

133. The reaction chamber of claim 121 wherein the liner comprises W.

134. The reaction chamber of claim 121 wherein the liner comprises Ir.

135. The reaction chamber of claim 121 wherein the liner comprises Pt.

136. The reaction chamber of claim 121 wherein the liner comprises Ti.

137. A plasma reaction chamber comprising:

at least one sidewall, the sidewall having an inner surface; and

at least one liner proximate the inner surface, wherein the liner comprises one or more elements selected from Group VIII of the periodic table.

138. The plasma reaction chamber of claim 137 wherein the sidewall comprises alumina.

139. The plasma reaction chamber of claim 137 wherein the liner is physically against the inner surface.

140. The reaction chamber of claim 137 wherein the liner comprises one or more of Co, Ni, Rh, Pd, Os, W, Ir, Pt, and Ti.

141. The reaction chamber of claim 137 wherein the liner comprises Co.

142. The reaction chamber of claim 137 wherein the liner comprises Ni.

143. The reaction chamber of claim 137 wherein the liner comprises Rh.

144. The reaction chamber of claim 137 wherein the liner comprises Pd.

145. The reaction chamber of claim 137 wherein the liner comprises Os.

146. The reaction chamber of claim 137 wherein the liner comprises W.

147. The reaction chamber of claim 137 wherein the liner comprises Ir.

148. The reaction chamber of claim 137 wherein the liner comprises Pt.

149. The reaction chamber of claim 137 wherein the liner comprises Ti.