Fabrication of chopper for particle beam instrument

• US 20050102829A1
• Filed: 08/20/2004
• Published: 05/19/2005
• Est. Priority Date: 06/08/2001
• Status: Active Grant

• Current Assignee: Protiveris, Inc.
• Original Assignee: Stillwater Scientific Instruments, Inc., The University Of Maine
• Inventors: LeGore, Lawrence J., Frederick, Brian G., Kleban, Peter H., Jackson, Robert H. III, Crothers, C. Bronson H., LeCursi, Nicholas
• Granted Patent: US 7,120,998 B2
• Time in Patent Office: Days
• US Class Current: 29/847
• CPC Class Codes: G01N 23/05 using neutrons
• CPC Class Codes: G21K 1/087 by electrical means
• CPC Class Codes: H01J 49/0018 Microminiaturised spectrometers, e.g. chip-integrated devices, Micro-Electro-Mechanical Systems [MEMS]
• CPC Class Codes: H01J 49/0031 Step by step routines describing the use of the apparatus H01J49/0081 takes precedence
• CPC Class Codes: H01J 49/061 Ion deflecting means, e.g. ion gates
• CPC Class Codes: H01J 49/446 Time-of-flight spectrometers
• CPC Class Codes: H01L 2924/00 Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
• CPC Class Codes: H01L 2924/0002 Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
• CPC Class Codes: Y10T 29/4902 Electromagnet, transformer or inductor
• CPC Class Codes: Y10T 29/49082 Resistor making
• CPC Class Codes: Y10T 29/49117 Conductor or circuit manufacturing
• CPC Class Codes: Y10T 29/49155 Manufacturing circuit on or in base
• CPC Class Codes: Y10T 29/49156 with selective destruction of conductive paths

Abstract

A technique for providing a grid for a gate such as utilized in gating a stream of ions or other particles in a spectrometer instrument. The grid of wires may, for example, be a so-called Bradbury-Nielson Gate that consists of a set of two electrically isolated sets of equally spaced wires that lie substantially in the same plane and alternate in potential. The method utilized to provide is to first fabricate a frame of an insulating substrate having a hole and depositing metal film patterns such that conductive portions are formed on either side of the hole. Conductive portions on either side form a series of terminating pads on the portion of the substrate closest to the hole and a bus bar. Grid wires are then formed by stretching a section of wire with desired constant tension across the hole and bonding the ends of the wire to a respective one of the pads on one side and bus bar on the other side. The method provides a rapid, inexpensive way to fabricate such modulating devices.

Claims

1. A method for manufacturing a gating grid for a charged particle stream, the gating grid comprising a first and second set of electrically isolated, equally spaced wires that lie in the same plane, the respective sets of wires to be applied to alternate potentials, the method comprising the steps of:

selecting an insulating substrate material to serve as a frame for a gating grid;

forming a gating grid attached to the substrate;

patterning a set of conductive portions on opposing sides of the grid, the conductive portions having a width such that they match a desired characteristic impedance of circuitry used to draw voltage to the grid.

2. A method as in claim 1 wherein the conductive portions are formed as a bus bar and isolating pads respectively.

3. A method as in claim 2 wherein along each side of the frame, a bus bar is formed outboard of a series of isolating pads, with the isolating pads formed on the inboard portion of the substrate closest to the hole.

4. A method according to claim 1 wherein the grid comprises individual wire sections attached to the patterned conductive portions.

5. A method as in claim 4 wherein the isolating pads are spaced at a distance which is twice the desired spacing of the grid wires.

6. A method as in claim 1 wherein the substrate is formed from alumina.

7. A method as in claim 1 wherein the conductive portions are patterned on the substrate by the steps of:

depositing a metal; and

defining a pattern by a process selected from a group consisting of a chemical etch process, a lift-off process, and a physical mask during the metal deposition step.

8. A method as in claim 7 wherein the step of depositing a metal film is carried out through application of an adhesion layer followed by deposition of the metal.

9. A grid as in claim 2 wherein the impedance of the bus bars matches that of a driving electronic component.

10. A grid as in claim 2 wherein the bus bars are arranged for termination by a terminating resistor.

11. A method as in claim 2 wherein the width of the bus bars formed in the patterning step is chosen to match the bus bar impedance to a desired characteristic impedance of the driving circuitry.

12. A method as in claim 2 wherein the grid is used for an electron particle stream in a time of flight (TOF) spectrometer.