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Gas distribution showerhead featuring exhaust apertures

  • US 20050103265A1
  • Filed: 11/19/2003
  • Published: 05/19/2005
  • Est. Priority Date: 11/19/2003
  • Status: Abandoned Application
First Claim
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1. An apparatus comprising:

  • walls enclosing a process chamber;

    a wafer susceptor positioned within the chamber;

    a first exhaust conduit in fluid communication with the chamber; and

    a processing gas source in fluid communication with the chamber through a gas distribution showerhead, the gas distribution showerhead comprising;

    a first channel in fluid communication with the processing gas source and with apertures distributed over a lower surface of the showerhead; and

    a second channel separate from the first channel and in fluid communication with a second exhaust conduit and with exhaust apertures distributed over the lower surface of the showerhead.

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