×

Method for depositing nanolaminate thin films on sensitive surfaces

  • US 20050106877A1
  • Filed: 10/19/2004
  • Published: 05/19/2005
  • Est. Priority Date: 10/15/1999
  • Status: Active Grant
First Claim
Patent Images

1. A method of depositing a material on a substrate in a reaction space, the substrate including a surface susceptible to halide attack, the method comprising providing alternated pulses of reactants in a plurality of deposition cycles, each cycle comprising:

  • supplying a first reactant to chemisorb no more than about one monolayer of a halide-terminated species over the surface;

    removing excess first reactant and reaction by-product from the reaction space; and

    gettering halides from the monolayer by exposure to a boron compound prior to repeating the cycle.

View all claims
  • 0 Assignments
Timeline View
Assignment View
    ×
    ×