Semiconductor thin film forming system
2 Assignments
0 Petitions
Accused Products
Abstract
In a semiconductor thin film forming system for modifying a predetermined region of a semiconductor thin film by exposing the semiconductor thin film to a projected light patterned through a pattern formed on a photo mask, the system includes a mechanism (opt20′) for uniformizing the light for exposure in a predetermined area on the photo mask. This system can provide a crystallized silicon film having a trap state density less than 1012 cm−2 and can provide a silicon-insulating film interface exhibiting a low interface state density.
64 Citations
23 Claims
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1. (canceled)
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2. A semiconductor thin film forming system for modifying a predetermined region of a semiconductor thin film by exposing the semiconductor thin film to a projected light patterned through an exposure pattern formed on a photo mask, said semiconductor thin film being formed on a substrate held on a substrate stage,
said system comprising a mechanism for sequentially scanning the semiconductor thin film with the patterned light by individually or concurrently driving the photo mask and the substrate stage.
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3-16. -16. (canceled)
Specification