Deposition mask and manufacturing method thereof

• US 20050115503A1
• Filed: 12/02/2004
• Published: 06/02/2005
• Est. Priority Date: 12/02/2003
• Status: Active Grant

• Current Assignee: Sony Corporation (Sony Group Corp.)
• Original Assignee: Sony Corporation (Sony Group Corp.)
• Inventors: Mori, Tsutomu, Nagasaki, Hideo, Hagiwara, Nobuo, Yagi, Hajime, Hirata, Tatsushiro
• Granted Patent: US 7,704,326 B2
• Time in Patent Office: Days
• US Class Current: 118/721
• CPC Class Codes: C23C 14/042 using masks
• CPC Class Codes: C23C 14/12 Organic material
• CPC Class Codes: H10K 59/35 comprising red-green-blue [RGB] subpixels
• CPC Class Codes: H10K 71/166 using selective deposition, e.g. using a mask

Abstract

A deposition mask with which position precision of a passage hole is improved and deposition can be conducted precisely and a manufacturing method thereof are provided. A mask body made of a metal thin film is fixed and tightly mounted on a frame body having an opening. The mask body has at least one pattern region including a plurality of passage holes for letting through a deposition material, a stress relaxation region including a plurality of fine holes provided at the periphery of the pattern region, and a holding region provided at the periphery of the stress relaxation region. The mask body is tightly mounted on the frame body at a holding region.

Claims

1. A deposition mask comprising:

a frame body having an opening; and

a mask body that includes a metal thin film,

wherein the mask body has a pattern region including a plurality of passage holes through which a deposition material can pass;

a stress relaxation region including a plurality of fine holes provided at a periphery of the pattern region; and

a holding region provided at the periphery of the stress relaxation region, and wherein

the mask body is mounted on the frame body at the holding region.

2. A deposition mask according to claim 1, wherein a position and a shape of the stress relaxation region are determined based on a result of a stress analysis generated in the mask body that is mounted on the frame body.

3. A deposition mask according to claim 1, wherein an area of the stress relaxation region decreases in size from a pattern region side toward a holding region side.

4. A deposition mask according to claim 3, wherein the stress relaxation region is in the shape of an approximate triangle.

5. A deposition mask according to claim 1, wherein the pattern region is in a shape of a rectangle, and the stress relaxation region surrounds a corner of the pattern region.

6. A deposition mask according to claim 1,

wherein the passage hole is an elongated hole, and a distance between the passage holes in a longitudinal direction thereof is less than a distance between the passage holes in a direction perpendicular to the longitudinal direction,

and wherein the stress relaxation region is facing to a side parallel to the longitudinal direction among sides of the pattern region.

7. A deposition mask according to claim 1, wherein a size and a shape of the fine hole are set based on a result of a stress analysis generated in the mask body mounted on the frame body.

8. A deposition mask according to claim 1, wherein two or more of the pattern regions are included and a plurality of the pattern regions are arranged in the shape of a rectangle as a whole.

9. A deposition mask according to claim 8, wherein one stress relaxation region is provided for a whole of the plurality of pattern regions.

10. A deposition mask according to claim 8, wherein one stress relaxation region is provided for each of the pattern regions.

11. A deposition mask according to claim 8, wherein the stress relaxation region is further provided between the plurality of pattern regions.

12. A deposition mask according to claim 1, wherein a shielding member for covering the stress relaxation region is provided in a position corresponding to the stress relaxation region of the mask body.

13. A deposition mask according to claim 1, wherein the pattern region is used for forming an organic layer of a display unit using an organic light-emitting device in which a first electrode, the organic layer including a light-emitting layer, and a second electrode are layered in sequence on a substrate.

14. A method of manufacturing a deposition mask comprising:

forming a mask body including at least one pattern region that includes a plurality of passage holes and a stress relaxation region including a plurality of fine holes formed around the pattern region on a metal thin film; and

mounting the mask body on a frame body having an opening at a holding region located in an outside of the stress relaxation region.

15. A method of manufacturing a deposition mask according to claim 14, wherein a position and a shape of the stress relaxation region are set based on a result of a stress analysis generated in the mask body mounted on the frame body.