×

Device manufacturing method, orientation determination method and lithographic apparatus

  • US 20050117794A1
  • Filed: 09/08/2004
  • Published: 06/02/2005
  • Est. Priority Date: 09/22/2003
  • Status: Active Grant
First Claim
Patent Images

1. A device manufacturing method comprising:

  • patterning a beam of radiation using a patterning device;

    determining an orientation of a substrate;

    aligning the substrate and the patterning device according to the orientation of the substrate; and

    projecting the patterned beam of radiation onto a target portion of a layer of radiation-sensitive material disposed on the substrate;

    wherein determining the orientation of the substrate includes determining a rotation of the substrate by;

    determining a distance vector in a measurement coordinate system between at least two structures disposed on said substrate, said at least two structures having corresponding features and of which relative positions are known in relation to a pattern coordinate system;

    decomposing the distance vector into a first distance along a first axis of the measurement coordinate system and a second distance along a second axis of the measurement coordinate system; and

    calculating a rotation of the pattern coordinate system in relation to the measurement coordinate system using the first and the second distance.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×