[PIXEL STRUCTURE AND FABRICATING METHOD THEREOF]
First Claim
1. A pixel structure, adapted to be disposed on a substrate, comprising:
- a scan line, disposed on the substrate;
a data line, disposed on the substrate;
an active element, disposed near to an intersection of the scan line and the data line on the substrate, and electrically coupled to the scan line and the data line;
a capacitor electrode, disposed on the substrate;
a pixel electrode, disposed over the capacitor electrode and electrically coupled to the active element, wherein the pixel electrode and the capacitor electrode form a pixel storage capacitor; and
an electrical field shielding layer, disposed between the data line and the pixel electrode.
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Accused Products
Abstract
A pixel structure and a fabricating method thereof are disclosed. The pixel structure is disposed on a substrate. The pixel structure comprises a scan line, a data line, an active element, a capacitor electrode, a pixel electrode and an electric field shielding layer. The fabricating method of the pixel structure comprises forming the scan line, the data line and the active element on the substrate first. The scan line and the data line are electrically coupled to the active element. Then, the capacitor electrode and the electric field shielding layer are formed on the substrate. Finally, the pixel electrode is formed on the substrate, covering the capacitor electrode and electrically coupled to the active element. The pixel electrode and the capacitor electrode form a pixel storage capacitor. The electric field shielding layer can avoid the interference between the data line and the pixel electrode.
33 Citations
25 Claims
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1. A pixel structure, adapted to be disposed on a substrate, comprising:
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a scan line, disposed on the substrate;
a data line, disposed on the substrate;
an active element, disposed near to an intersection of the scan line and the data line on the substrate, and electrically coupled to the scan line and the data line;
a capacitor electrode, disposed on the substrate;
a pixel electrode, disposed over the capacitor electrode and electrically coupled to the active element, wherein the pixel electrode and the capacitor electrode form a pixel storage capacitor; and
an electrical field shielding layer, disposed between the data line and the pixel electrode. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A method of fabricating a pixel structure, comprising:
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sequentially forming an active element, a scan line and a data line on a substrate, the active element being electrically coupled to the scan line and the data line;
forming a capacitor electrode on the substrate;
forming an electrical field shielding layer on the substrate, covering the data line; and
forming a pixel electrode on the substrate, covering the capacitor electrode and electrically coupled to the active element, wherein the pixel electrode and the capacitor electrode are coupled as a pixel storage capacitor. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25)
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Specification