Substrate-holding technique

• US 20050122505A1
• Filed: 12/03/2004
• Published: 06/09/2005
• Est. Priority Date: 12/08/2003
• Status: Active Grant

• Current Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Original Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Inventors: Miyajima, Yoshikazu
• Granted Patent: US 7,379,162 B2
• Time in Patent Office: Days
• US Class Current: 355/72
• CPC Class Codes: G03B 27/58 Baseboards, masking frames, or other holders for the sensitive material G03B27/53 takes precedence ; for electrophotographic copiers G03G15/65
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70716 Stages
• CPC Class Codes: G03F 7/70866 of mask or workpiece

Abstract

A substrate holding apparatus contacts an undersurface of a substrate and holds the substrate. At least a portion of a top surface of the substrate is to be immersed in liquid. The apparatus includes a chuck unit to attract the substrate and a preventing system to prevent the liquid from reaching the undersurface of the substrate.

Claims

1. A substrate holding apparatus which contacts an undersurface of a substrate and holds the substrate, at least a portion of a top surface of the substrate being immersed in liquid, said apparatus comprising:

a chuck unit to attract the substrate; and

a preventing system to prevent the liquid from reaching the undersurface of the substrate.

2. An apparatus according to claim 1, wherein said preventing system comprises an elastic sealing member arranged so that said elastic sealing member is in contact with the undersurface along a periphery of the undersurface.

3. An apparatus according to claim 1, wherein said preventing system comprises a differential exhaust system to differentially-exhaust a space between the undersurface and said chuck unit along a periphery of the undersurface.

4. An apparatus according to claim 1, wherein said preventing system comprises a liquid-sealant pool arranged along a periphery of the chuck unit.

5. An apparatus according to claim 4, wherein said preventing system comprises a groove defined by said chuck unit, and a supply unit to supply a liquid sealant to said groove.

6. An apparatus according to claim 5, wherein said preventing system comprises an exhaust unit to exhaust the liquid sealant in said groove.

7-8. -8. (canceled)

9. An exposure apparatus, comprising:

a projection optical system for projecting a pattern of an original onto a substrate;

a liquid application device for applying liquid to the substrate;

a chuck unit for securing the substrate; and

a liquid prevention device for preventing liquid from contacting an undersurface of the substrate.

10. A method of manufacturing a device, comprising the steps of:

providing a projecting optical system for projecting a pattern of an original onto a substrate;

securing the substrate with a chuck unit;

applying a liquid to the substrate; and

preventing liquid from contacting an undersurface of the substrate.

11. A substrate holding apparatus for securing an underside of a substrate, with at least a portion of a top surface of the substrate being immersed in liquid, said apparatus comprising:

a chuck unit to secure the substrate from the underside; and

liquid sealing means for sealing the underside of the substrate from exposure to the liquid.

12. A substrate holding apparatus according to claim 11, wherein said liquid sealing means includes an elastic sealing member arranged to be in contact along a periphery of the undersurface.

13. A substrate holding apparatus according to claim 11, wherein said liquid sealing means includes an exhaust system to exhaust a space along a periphery of the undersurface.

14. A substrate holding apparatus according to claim 13, wherein said exhaust system includes a plurality of ducts, with each said duct having a different exhaust pressure.

15. A substrate holding apparatus according to claim 11, wherein said liquid sealing means includes a liquid sealant pool arranged around a periphery of said chuck unit.

16. A substrate holding apparatus according to claim 15, wherein said liquid sealant pool includes a liquid sealant supply duct and a liquid sealant exhaust duct.

17. A substrate holding apparatus according to claim 11, wherein said chuck unit is a vacuum chuck.

18. A substrate holding apparatus according to claim 11, wherein said chuck unit is an electrostatic chuck.