Thin-film structure and method for producing the same
First Claim
Patent Images
1. A thin-film structure comprising:
- a base on which is disposed a plurality of parallel line-shaped corrugated structures;
a plurality of parallel plate-shaped metals provided on said base, said plate-shaped metals being disposed at a fixed angle with a surface of said base, and an end of each plate-shaped metal being in contact with said base along the direction of said line-shaped corrugated structure, wherein an average gap (d) between said plate-shaped metals, a film thickness (H), and an average width (W), in terms of a working wavelength λ
, and an angle (θ
) relative to said base lie within the following ranges;
0.07λ
<
d<
0.20λ
0.15λ
<
H<
0.90λ
0.05λ
<
W<
0.18λ
0 degθ
25 deg.
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Abstract
A thin-film structure includes plate-shaped metals or plate-shaped structures in which a plate-shaped metal and a plate-shaped dielectric are in contact. The plate-shaped metal or structures are formed on a transparent base having a surface with line-shaped corrugated structures. The plate-shaped metals or structures are perpendicular to or oblique to the surface of the base. The thin-film structure has characteristics suitable for polarizers used in liquid crystal projectors and the like.
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Citations
15 Claims
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1. A thin-film structure comprising:
-
a base on which is disposed a plurality of parallel line-shaped corrugated structures;
a plurality of parallel plate-shaped metals provided on said base, said plate-shaped metals being disposed at a fixed angle with a surface of said base, and an end of each plate-shaped metal being in contact with said base along the direction of said line-shaped corrugated structure, wherein an average gap (d) between said plate-shaped metals, a film thickness (H), and an average width (W), in terms of a working wavelength λ
, and an angle (θ
) relative to said base lie within the following ranges;
0.07λ
<
d<
0.20λ
0.15λ
<
H<
0.90λ
0.05λ
<
W<
0.18λ
0 degθ
25 deg. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. The method for making a thin-film structure comprising the steps of:
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providing a base formed from a substrate having thereron a plurality of parallel line-shaped corrugated structures;
forming a transparent dielectric film on said substrate by applying ions or atoms or clusters of an element for forming a dielectric from a direction that is oblique relative to a normal of said substrate and at a fixed angle relative to the direction of said line-shaped corrugated structures formed on said substrate, while at the same time, applying ions or atoms or clusters of an element for forming a dielectric from an opposite direction on the other side of a normal plane containing said lines on said substrate; and
subsequently forming a film by applying metal ions or metal atoms or metal clusters from an oblique direction relative to a normal of said substrate surface and at a fixed angle relative to the direction of said line-shaped corrugated structures.
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Specification