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IMPRINT LITHOGRAPHY FOR SUPERCONDUCTOR DEVICES

  • US 20050123674A1
  • Filed: 05/05/2003
  • Published: 06/09/2005
  • Est. Priority Date: 05/05/2003
  • Status: Active Grant
First Claim
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1. A method of building a superconductor device on a substrate, comprising:

  • depositing an imprint layer on at least a portion of the substrate;

    imprinting the imprint layer to provide at least one imprinted recess in the imprint layer and a non-imprinted portion of the imprint layer that at least partially surrounds the imprinted recess in the imprint layer;

    depositing a first superconductor layer in at least a portion of the imprinted recess of the imprint layer;

    forming a tunnel junction at least partially in contact with the first superconductor layer; and

    depositing a second superconductor layer at least partially in contact with the tunnel junction, wherein at least a portion of the second superconductor layer extends beyond a portion of the imprinted recess of the imprint layer in which the first superconductor layer is deposited, wherein the first superconductor layer, the tunnel junction, and the second superconductor layer combine to form the superconductor device.

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