Surface treatment apparatus
First Claim
1. A surface treatment apparatus for making raw material gas plasma by generating plasma, in a casing provided with plasma generation means, a raw material gas inlet and a substrate support table, by the plasma generation means and giving plasma treatment to the surface of a substrate placed on the substrate support table, wherein:
- said casing is defined into two chambers, a plasma generation chamber provided with said plasma generation means and a substrate treatment chamber provided with said substrate support table;
said substrate treatment chamber and said plasma generation chamber are connected through one or more plasma nozzles;
at least one of said plasma nozzles is made a hollow discharge generation area; and
a hollow plasma generation electrode comprising one or more hollow discharge generation areas is disposed in said plasma generation chamber.
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Accused Products
Abstract
The present invention provides a surface treatment apparatus which can treat a surface with high speed and high quality. A casing of a surface treatment apparatus is defined into two chambers, a plasma generation chamber provided with a plasma generation electrode and a substrate treatment chamber provided with a substrate support table. A plasma nozzle is formed on an anode electrode constituting a partition wall of the both chambers. A recess is formed on an upper cathode electrode. Further, the plasma nozzle is used as a hollow anode discharge generation area, and the recess as a hollow cathode discharge generation area.
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Citations
19 Claims
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1. A surface treatment apparatus for making raw material gas plasma by generating plasma, in a casing provided with plasma generation means, a raw material gas inlet and a substrate support table, by the plasma generation means and giving plasma treatment to the surface of a substrate placed on the substrate support table, wherein:
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said casing is defined into two chambers, a plasma generation chamber provided with said plasma generation means and a substrate treatment chamber provided with said substrate support table;
said substrate treatment chamber and said plasma generation chamber are connected through one or more plasma nozzles;
at least one of said plasma nozzles is made a hollow discharge generation area; and
a hollow plasma generation electrode comprising one or more hollow discharge generation areas is disposed in said plasma generation chamber. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
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Specification