Method and apparatus for patterning a workpiece and methods of manufacturing the same
First Claim
Patent Images
1. A spatial light modulator comprising:
- a substrate;
at least one reflective surface, including at least two portions, adapted to induce a phase difference between a radiation reflected by the at least two portions;
wherein the phase difference is induced by at least one of a phase plate and a step height difference between the at least two portions.
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Abstract
An apparatus for patterning a work piece including a source, and at least one reflective tilting surface adapted to induce a phase difference using at least one of a phase shifting plate and a difference in step height. A method corresponding to the apparatus for patterning a work piece. A method of manufacturing the apparatus for patterning a work piece and a Spatial Light Modulator, which may be included therein.
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Citations
28 Claims
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1. A spatial light modulator comprising:
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a substrate;
at least one reflective surface, including at least two portions, adapted to induce a phase difference between a radiation reflected by the at least two portions;
whereinthe phase difference is induced by at least one of a phase plate and a step height difference between the at least two portions. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A method of manufacturing a device for patterning a workpiece, the method comprising:
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forming, on a substrate, a conductive layer including a plurality of conductive areas with non-conductive areas disposed therebetween;
forming a temporary layer on the plurality of conductive and non-conductive areas;
forming a reflective layer on the temporary layer; and
forming a material layer on at least one portion of the reflective layer.
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13. A method of manufacturing a reflective layer for use in a spatial light modulator, the method comprising:
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forming a temporary layer on a reflective surface;
exposing a portion of the temporary layer to radiation such that the portion of the reflective surface is exposed and a remaining portion of the temporary layer is unexposed;
removing either the unexposed or the exposed temporary layer;
covering the remaining portion of the temporary layer and the reflective surface with a shifting material; and
removing the temporary layer and an associated part of the shifting material from a portion of the reflective surface. - View Dependent Claims (14, 15, 16, 17, 18)
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19. A method for patterning a workpiece including:
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generating radiation, including at least a first portion and at least a second portion, and reflecting at least the first portion and the second portion of the radiation toward the workpiece;
inducing a phase difference between at least the first portion and the second portion of the radiation;
irradiating at least the first portion and the second portion of the radiation at the workpiece; and
forming a pattern on the workpiece using the first and the second portions of the radiation. - View Dependent Claims (20, 21, 22, 23)
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24. An apparatus for patterning a workpiece, the apparatus comprising:
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a source adapted to generate radiation;
at least one reflective device, adapted to form a pattern on the workpiece and to induce a phase difference in the radiation;
whereinthe phase difference is induced by at least one of a phase shifting plate and a difference in step height. - View Dependent Claims (25, 26, 27, 28)
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Specification