System and method for constructing large-scaled drawings of similar objects

• US 20050129314A1
• Filed: 04/02/2004
• Published: 06/16/2005
• Est. Priority Date: 12/10/2003
• Status: Abandoned Application

• Current Assignee: Ming-Jang Chen
• Original Assignee: Ming-Jang Chen
• Inventors: Chen, Ming-Jang
• Application Number:
  US10/815,819
• Publication Number:
  US 20050129314A1
• Time in Patent Office: Days
• US Class Current: 382/209
• CPC Class Codes: G06T 11/001 Texturing; Colouring; Generation of texture or colour inpainting G06T5/77

Abstract

This invention provides a system and method for constructing pictures, particularly to one capable of drawing large-scaled drawings of similar objects through the analog rule and iterative duplication, such that an end-user is able to create and design various fractals or other complicated pictures containing large-scaled drawings of similar objects based on simple designs of patterns and targeted line segments as well adjustment of baselines. This invention may be adopted in the fields of artistic designs, drafting and instructions due to the simple operations as involved.

Claims

1. A method for constructing pictures, for generating large-scaled drawings of similar objects, comprising the steps of:

(a) inputting a pattern, a baseline, and a line segment at a first, a second and a third positions, respectively, by an end-user, the pattern, baseline and line segment having a first, a second and a third dimensions and a first, a second and a third azimuths, respectively;

(b) analyzing a relative relationship existing between the pattern and the baseline in accordance with the positions, dimensions and azimuths of the pattern and baseline;

(c) generating a first duplication at a fourth position through iterative duplication, by scaling the pattern with a first ratio and then translating the pattern in accordance with the second position, dimension and azimuth of the line segment using the relative relationship between the pattern and the baseline as a reference, such that the first duplication and the targeted line segment conform with the relative relationship between the pattern and the baseline; and

(d) displaying the first duplication at the fourth position as a first picture for examination of the end-user.

2. The method of claim 1, wherein the pattern includes at least a first line segment, rendering the first duplication to include at least a second line segment due to conformity with the relative relationship.

3. The method of claim 2, further comprising the steps of:

(e) identifying a fifth position at where the second line segment is located, and detecting a fifth dimension and azimuth of the second line segment;

(f) treating the second line segment as a new targeted line segment, and generating a second duplication of the pattern at a sixth position by scaling the pattern with a second ratio and translating the pattern in accordance with the fifth position, dimension, azimuth of the second line segment using the relative relationship between the pattern and the baseline as a reference, such that the second duplication and the second line segment conform with the relative relationship between the pattern and the baseline; and

(g) displaying the second duplication at the sixth position as a second picture for examination of the end-user.

4. The method of claim 3, wherein the second line segment is an iterated line serving as a targeted line segment to be used in the subsequent iterative duplication.

5. The method of claim 4, further comprising the steps of:

(h) treating the plural line segments generated by repeating steps (e) and (f) as plural iterated lines and generating different pictures using the plural iterated lines.

6. A system for constructing pictures, for generating large-scaled drawings of similar objects, comprising:

a storage module;

an interface device serving as an input device to be used by an end-user to input a pattern, a baseline and a targeted line segment;

a detecting unit, for detecting and identifying positioning information, including relative positions, dimensions, azimuths and centers of the pattern, baseline and targeted line segment upon inputting the pattern, baseline and targeted line segment, and storing the positioning information in the storage module;

an analyzing unit, for obtaining a relative relationship existing between the pattern and the baseline to be stored in the storage module upon accessing the positioning information stored in the storage module; and

a calculating unit, for calculating positioning information of a first duplication based on the positioning information of the targeted line segment upon accessing the relative relationship stored in the storage module and the positioning information of the targeted line segment, thereby subjecting a relative relationship between the first duplication and the targeted line segment to conform with the relative relationship between the pattern and the baseline, and for displaying the first duplication on the interface device.

7. The system of claim 6, wherein the pattern includes at least a first line segment, rendering the first duplication to include at least a second line segment due to conformity with the relative relationship.

8. The system of claim 7, wherein the calculating unit treats the second line segment as a new targeted line segment, to generate a second duplication upon accessing the relative position, dimension, azimuth and center of the second line segment.

9. The system of claim 8, wherein the calculating unit allows configuration of attributes of the line segment of the second duplication or the object in response to configuration made by the end-user to facilitate advanced processing of the second duplication.

10. A method for constructing pictures, for generating large-scaled drawings of similar objects, comprising the steps of:

providing a pattern, a baseline and a targeted line segment;

analyzing a relative relationship between the pattern and the baseline; and

generating a first duplication along the targeted line segment having a relative relationship identical to the relative relationship and displaying the first duplication as a first picture.

11. The method of claim 10, further comprising the steps of:

treating each line segment of the first duplication as a new targeted line segment; and

generating a second duplication along each of the line segments of the first duplication having a relative relationship identical to the relative relationship and displaying the second duplications as a second picture.

12. The method of claim 11, further comprising the step of:

configuring attributes of the second duplication by subjecting the second duplication to transformation, such as mirror reflection and rotation and hue tuning, to generate transformed drawings of similar pictures.

13. The method of claim 11, wherein the plural targeted line segments in the first duplication are treated as plural iterated lines, and the number of the iterated lines that are not subject to subsequent iterative duplication, and the frequency of the number of the iterated lines that are subject to subsequent iterative duplication or alternative iterative duplication may be configured to generate a picture having timing differences.

14. The method of claim 12, wherein each targeted line segment may be transformed into a new picture by the transformtion randomly or functionally.

15. A system for constructing pictures, for generating large-scaled drawings of similar objects, comprising:

an interface device and a system control module, the interface device serving as an input device to be used by an end-user to input a pattern, a baseline and a targeted line segment to generate a duplication, characterized in that;

the system control module generates a first duplication analogous to the pattern upon identifying positioning information of and analyzing a relative relationship between the pattern and the baseline, the first duplication being displayed on the interface device, such that a relative relationship between the first duplication and the targeted line segment conforms with the relative relationship between the pattern and the baseline.

16. The system of claim 15, wherein the system control module treats the first duplication as a new targeted line segment to generate a second duplication analogous to the pattern and displayed on the interface device, such that a relative relationship between the second and first duplications conforms with the relative relationship between the pattern and the baseline.

17. The system of claim 16, wherein the line segment in the pattern is subject to configuration of attributes, such as mirror reflection and rotation, and hue tuning to generate transformed drawings of similar pictures for the second duplication.