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Lithographic apparatus, alignment apparatus, device manufacturing method, and a method of converting an apparatus

  • US 20050132914A1
  • Filed: 12/23/2003
  • Published: 06/23/2005
  • Est. Priority Date: 12/23/2003
  • Status: Active Grant
First Claim
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1. A method of converting a projection lens system of a lithographic projection apparatus, the method comprising at least one of exchanging a compensating optical element in the optical path of the projection lens system for another compensating optical element, adding a further compensating optical element in the optical path of the projection lens system, and removing a further compensating optical element in the optical path of the projection lens system, such that with a liquid between the projection lens system and the point of focus of the projection lens system, the distance of the point of focus of the projection lens system from a non parallel optical element will remain the same as without the liquid between the projection lens system and the point of focus of the projection lens system.

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