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Compensation of spacing between magnetron and sputter target

  • US 20050133361A1
  • Filed: 09/16/2004
  • Published: 06/23/2005
  • Est. Priority Date: 12/12/2003
  • Status: Abandoned Application
First Claim
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1. In a magnetron sputter reactor including a chamber sealable to a sputtering target, a support in said reactor for holding a substrate to be processed, and a magnetron placeable on a backside of said target opposite said support, a magnetron control system comprising:

  • a lift mechanism affixed to a support of said magnetron capable of varying a distance of said magnetron from said backside of said target; and

    a controller for controlling a degree of said varying said distance during processing of a sequence of substrates.

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