Liquid immersion type exposure apparatus

• US 20050134817A1
• Filed: 06/24/2004
• Published: 06/23/2005
• Est. Priority Date: 06/25/2003
• Status: Abandoned Application

• Current Assignee: Canon Ayutthaya Limited (Canon Inc.)
• Original Assignee: Canon Ayutthaya Limited (Canon Inc.)
• Inventors: Nakamura, Takashi
• Application Number:
  US10/877,142
• Publication Number:
  US 20050134817A1
• Time in Patent Office: Days
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041

Abstract

Disclosed is a liquid immersion type exposure apparatus which is applicable not only to a liquid immersion exposure apparatus of the type that an exposure substrate as a whole is immersed in a liquid vessel but also to a liquid immersion exposure apparatus of the type that a liquid medium is held in a portion between the exposure substrate and a termination end portion of a projection optical system, and by which production of bubbles can be reduced without interference with exposure. In one preferred from, a degassing system for removing a gas dissolved in the liquid is provided in a liquid medium supplying path and/or a liquid medium collecting path, by which production of bubbles is reduced sufficiently.

Claims

1. A liquid immersion type exposure apparatus, comprising:

a projection optical system for projecting a pattern of a mask onto a substrate; and

a liquid supplying and collecting system for supplying a liquid medium to at least a portion of a space between said projection optical system and the substrate and for collecting the supplied liquid medium,

wherein said liquid supplying and collecting system includes degassing means for degassing the liquid medium, said degassing means being provided in a path for supplying the liquid medium and/or a path for collecting the liquid medium.

2. An apparatus according to claim 1, wherein the path for supplying the liquid medium and the path for collecting the liquid medium, of said liquid supplying and collecting system, are interchangeable.

3. An apparatus according to claim 1, wherein the path for supplying the liquid medium and/or the path for collecting the liquid medium, of said liquid supplying and collecting system, extends through a barrel of said projection optical system or an inside of a termination end portion of said projection optical system.

4. An apparatus according to claim 2, wherein the path for supplying the liquid medium and/or the path for collecting the liquid medium, of said liquid supplying and collecting system, extends through a barrel of said projection optical system or an inside of a termination end portion of said projection optical system.

10. A device manufacturing method, comprising the steps of:

exposing a substrate by use of a liquid immersion type exposure apparatus as recited in claim 1;

and

developing the exposed substrate.

5. A liquid immersion type exposure apparatus, comprising:

a projection optical system for projecting a pattern of a mask onto a substrate; and

a liquid supplying and collecting system for supplying a liquid medium to at least a portion of a space between said projection optical system and the substrate and for collecting the supplied liquid medium,

wherein the path for supplying the liquid medium and the path for collecting the liquid medium, of said liquid supplying and collecting system, are interchangeable.

6. An apparatus according to claim 5, wherein the path for supplying the liquid medium and the path for collecting the liquid medium, are interchanged in accordance with a movement direction of the substrate.

7. An apparatus according to claim 5, wherein the path for supplying the liquid medium and/or the path for collecting the liquid medium, of said liquid supplying and collecting system, extends through a barrel of said projection optical system or an inside of a termination end portion of said projection optical system.

11. A device manufacturing method, comprising the steps of:

exposing a substrate by use of a liquid immersion type exposure apparatus as recited in claim 5;

and

developing the exposed substrate.

8. A liquid immersion type exposure apparatus, comprising:

a projection optical system for projecting a pattern of a mask onto a substrate; and

a liquid supplying and collecting system for supplying a liquid medium to at least a portion of a space between said projection optical system and the substrate and for collecting the supplied liquid medium,

wherein the path for supplying the liquid medium and/or the path for collecting the liquid medium, of said liquid supplying and collecting system, extends through a barrel of said projection optical system or an inside of a termination end portion of said projection optical system.

12. A device manufacturing method, comprising the steps of:

exposing a substrate by use of a liquid immersion type exposure apparatus as recited in claim 8;

and

developing the exposed substrate.

9. An apparatus according to claim 9, wherein the termination end portion of said projection optical system is an optical element of said projection optical system, at the substrate side.