Substrate meniscus interface and methods for operation
First Claim
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1. An apparatus for processing a substrate with a fluid meniscus to be applied to a surface of the substrate, comprising:
- a docking surface configured to be placed adjacent to an edge of the substrate, the docking surface being about in the same plane as the substrate, and providing a transition interface to allow the fluid meniscus to enter and exit the surface of the substrate.
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Abstract
An apparatus for processing a substrate with a fluid meniscus to be applied to a surface of the substrate is provided which includes a docking surface configured to be placed adjacent to an edge of the substrate where the docking surface is in the same plane as the substrate. The docking surface provides a transition interface to allow the fluid meniscus to enter and exit the surface of the substrate.
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Citations
20 Claims
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1. An apparatus for processing a substrate with a fluid meniscus to be applied to a surface of the substrate, comprising:
a docking surface configured to be placed adjacent to an edge of the substrate, the docking surface being about in the same plane as the substrate, and providing a transition interface to allow the fluid meniscus to enter and exit the surface of the substrate. - View Dependent Claims (2, 3, 4)
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5. An apparatus for use in processing a substrate, comprising:
a coupon magazine configured to hold a docking station for a proximity head, the coupon magazine being configured so the docking station is held in place adjacent to an edge of the substrate. - View Dependent Claims (6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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16. A method for processing a substrate, comprising:
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positioning a transition surface substantially coplanar to a substrate surface, the transition surface being adjacent to an edge of the substrate; and
moving a fluid meniscus between the transition surface and the substrate surface. - View Dependent Claims (17, 18, 19, 20)
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Specification