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Plasma processing apparatus

  • US 20050145341A1
  • Filed: 11/18/2004
  • Published: 07/07/2005
  • Est. Priority Date: 11/19/2003
  • Status: Abandoned Application
First Claim
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1. A plasma processing apparatus for imparting an electromagnetic field to reactant gas introduced into a evacuated processing chamber to excite plasma and performing plasma processing on a substrate set in the processing chamber, comprising:

  • a vacuum vessel which defines the processing chamber in which the substrate is held and the plasma processing for the substrate is performed, and which includes a dielectric window forms a part of the vacuum vessel, for hermetically closing the vacuum chamber, and a gas supply portion for supplying the reactant gas into the processing chamber;

    a plasma-exciting coil which is placed so as to confront the processing chamber via the dielectric window, for imparting an electromagnetic field to interior of the processing chamber via the dielectric window with RF power applied;

    an evacuation unit for evacuating the interior of the processing chamber to draw a vacuum so that pressure in the processing chamber is kept generally constant;

    an RF power supply for applying the RF power to the plasma-exciting coil; and

    a liquid storage vessel which includes the dielectric window as a part thereof and which defines in interior thereof a liquid chamber for storing therein an electrically insulative liquid so that an opposite surface to a processing chamber-side surface of the dielectric window is immersed in the liquid and in which the plasma-exciting coil is placed.

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