Lithographic apparatus and device manufacturing method
First Claim
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1. A device manufacturing method, comprising:
- (a) inspecting a pattern formed on a first substrate, which was patterned according to a first pattern;
(b) creating a second pattern in response to the inspected pattern;
(c) patterning a second substrate using the second pattern; and
(d) coupling the second substrate to the first substrate.
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Abstract
A method of manufacturing first and second substrates that are coupled together, e.g., an active and passive plate of a flat panel display. The active plate is formed according to a standard pattern and inspected. The passive plate is then formed by modifying the pattern data for the passive plate according to the actual pattern formed on the active plate to ensure that the patterns formed on the active and passive plates correspond closely.
27 Citations
11 Claims
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1. A device manufacturing method, comprising:
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(a) inspecting a pattern formed on a first substrate, which was patterned according to a first pattern;
(b) creating a second pattern in response to the inspected pattern;
(c) patterning a second substrate using the second pattern; and
(d) coupling the second substrate to the first substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A device manufacturing method, comprising:
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(a) inspecting at least one of a plurality of first substrates patterned according to a first pattern;
(b) generating a second pattern in response to data generated by the inspection;
(c) projecting beams of radiation, patterned according to the second pattern, onto a plurality of second substrates; and
(d) coupling each of the plurality of first substrates to a respective one of the plurality of second substrates. - View Dependent Claims (9)
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10. A lithographic apparatus, comprising:
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an inspection system that inspects a first substrate patterned according to a first pattern;
a controller that creates or modifies a second pattern, in response to data generated by the inspection system;
an array of individually controllable elements that pattern the beam according to the second pattern;
a projection system that projects the patterned beam onto a target portion of a second substrate; and
an assembly system that coupled together the first and second substrates.
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11. The lithographic apparatus of claim 12, wherein
a plurality of the first and second substrates are used; - and
the assembly system forms a plurality of respective pairs of coupled together one of the first and second substrates.
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Specification