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Fabrication of MEMS devices with spin-on glass

  • US 20050145962A1
  • Filed: 02/11/2005
  • Published: 07/07/2005
  • Est. Priority Date: 08/23/2002
  • Status: Active Grant
First Claim
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1. A microstructure for use in the manufacture of a MEMS device, comprising:

  • a bulk layer having a rough surface;

    at least one layer of photo-insensitive spin-on planarizing material deposited on said bulk layer;

    a photoresist layer deposited on said planarizing material; and

    a deep etch trench extending through said photoresist layer into said bulk layer.

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