Exposure apparatus and device manufacturing method

• US 20050146694A1
• Filed: 01/04/2005
• Published: 07/07/2005
• Est. Priority Date: 01/07/2004
• Status: Active Grant

• Current Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Original Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Inventors: Tokita, Toshinobu
• Granted Patent: US 7,528,930 B2
• Time in Patent Office: Days
• US Class Current: 355/30
• CPC Class Codes: G03B 27/52 Details
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70891 Temperature

Abstract

An exposure apparatus includes a projection optical system for projecting a pattern on a reticle onto a substrate, the projection optical system including an optical element closest to the substrate, an illumination optical system for illuminating the reticle using light from a light source, and a temperature controller for controlling a temperature of the optical element and thereby a temperature of a fluid that is filled in a space between the optical element in the projection optical system and the substrate, the exposure apparatus exposing the substrate via said projection optical system and the fluid.

Claims

1. An exposure apparatus comprising:

a projection optical system for projecting a pattern of a reticle onto a substrate, said projection optical system including an optical element closest to the substrate;

a temperature controller for controlling a temperature of the optical element and thereby a temperature of a fluid that is filled in a space between the optical element in said projection optical system and the substrate, said exposure apparatus exposing the substrate via said projection optical system and the fluid.

2. An exposure apparatus according to claim 1, further comprising a support member for supporting the optical element, said support member having a channel,

wherein said temperature controller supplies the fluid that has been temperature-controlled, to the channel in said support member.

3. An exposure apparatus according to claim 2, wherein the channel of the support member is provided in the support member.

4. An exposure apparatus according to claim 1, wherein said temperature controller blows the fluid that has been temperature-controlled, against the optical element.

5. An exposure apparatus according to claim 2, wherein said temperature controller controls the temperature of the fluid based on exposure position information indicative of a position of an area on the substrate which area is being exposed.

6. An exposure apparatus according to claim 2, wherein said temperature controller controls the temperature of the fluid based on exposure light irradiation information indicative of an integral exposure does to substrate.

7. An exposure apparatus according to claim 2, further comprising a holder for holding the substrate, said holder having a channel,

wherein said temperature controller supplies the fluid that has been temperature-controlled, to the channel in the holder.

12. An exposure apparatus according to claim 2, wherein the fluid is one of water, helium, and nitrogen.

13. A device manufacturing method comprising the steps of:

exposing a substrate using an exposure apparatus according to claim 1;

and

developing the substrate that has been exposed.

8. An exposure apparatus comprising:

a projection optical system for projecting a pattern of a reticle onto a substrate;

a holder for holding the substrate, said holder having a channel; and

a temperature controller for supplying a fluid that has been temperature-controlled, to the channel in the holder the fluid being filled in a space between said projection optical system and the substrate, said exposure apparatus exposing the substrate via said projection optical system and the fluid.

9. An exposure apparatus according to claim 8, wherein the channel includes a plurality of sub-channels.

10. An exposure apparatus according to claim 8, wherein said temperature controller independently controls a temperature of each fluid that flows through a corresponding one of the sub-channels.

11. An exposure apparatus according to claim 8, wherein said temperature controller controls a temperature of each fluid that flows through a corresponding one of the sub-channels based on exposure position information.