Device manufacturing method, device manufactured thereby and a mask for use in the method
First Claim
1. A device manufacturing method, said method comprising:
- providing a beam of radiation;
positioning a reflective patterning structure to reflect at least a portion of the provided beam as a patterned beam of radiation having a pattern in its cross-section; and
using a projection system to project the patterned beam of radiation to form an image on a target portion of a layer of radiation-sensitive material that at least partially covers a substrate, wherein said positioning includes at least one among shifting and tilting a nominal reflective surface of the reflective patterning structure with respect to a nominal object plane of the projection system according to a distortion value.
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Accused Products
Abstract
A device manufacturing method according to one embodiment of the invention includes positioning a reflective patterning structure to reflect at least a portion of a beam of raditaion as a patterned beam of radiation having a pattern in its cross-section. The method also includes using a projection system to project the patterned beam of radiation to form an image on a target portion of a layer of radiation-sensitive material. Positioning includes at least one among shifting and tilting a nominal reflective surface of the reflective patterning structure with respect to a nominal object plane of the projection system according to a distortion value.
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Citations
15 Claims
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1. A device manufacturing method, said method comprising:
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providing a beam of radiation;
positioning a reflective patterning structure to reflect at least a portion of the provided beam as a patterned beam of radiation having a pattern in its cross-section; and
using a projection system to project the patterned beam of radiation to form an image on a target portion of a layer of radiation-sensitive material that at least partially covers a substrate, wherein said positioning includes at least one among shifting and tilting a nominal reflective surface of the reflective patterning structure with respect to a nominal object plane of the projection system according to a distortion value. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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Specification