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Material deposition system and a method for coating a substrate or thermally processing a material in a vacuum

  • US 20050147753A1
  • Filed: 12/10/2004
  • Published: 07/07/2005
  • Est. Priority Date: 10/22/1999
  • Status: Abandoned Application
First Claim
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1. A material deposition system for depositing material onto a surface of a substrate, the system comprising:

  • a first body element having an interior cavity and at least one exit aperture extending through the first body element;

    at least one second body element having an interior cavity and at least one exit aperture extending through the at least one second body element, the interior cavity of the at least one second body element configured to contain the material, wherein the at least one exit aperture of the at least one second body element is spatially separated from and in fluid communication with the at least one exit aperture of the first body element;

    wherein at least one of the first body element and the at least one second body element are rotatable with respect to each other, such that the at least one exit aperture of the first body element and the at least one exit aperture of the second body element can be aligned and misaligned with respect to each other.

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