Lithographic apparatus, method of determining a model parameter, device manufacturing method, and device manufactured thereby

• US 20050147902A1
• Filed: 12/09/2004
• Published: 07/07/2005
• Est. Priority Date: 12/09/2003
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV), IMEC International
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Van Der Schaar, Maurits, Schets, Sicco Ian, Huijbregtse, Jeroen, Swinnen, Bart Luc
• Granted Patent: US 7,558,643 B2
• Time in Patent Office: Days
• US Class Current: 430/22
• CPC Class Codes: G03F 9/7092 Signal processing

Abstract

A method according to one embodiment of the invention relates to determining at least one parameter of a model that provides information about a position of an object. The object may include a plurality of alignment marks of which desired positions are known. The method includes measuring a plurality of positional parameters for each alignment mark. Based on the measured plurality of positional parameters, which are weighted with weighing coefficients, at least one parameter of the model of the object is determined. The numerical value of each weighing coefficient is determined together with the at least one parameter of the model.

Claims

1. A method of determining at least one parameter of an object model, the object model providing information about a position of an object, the object having a plurality of alignment marks with desired positions that are known, the method comprising:

receiving signals from the plurality of alignment marks;

determining a strength of the received signals;

determining weighing coefficients based on the strength of the received signals;

measuring a plurality of positional parameters for the plurality of alignment marks, the plurality of positional parameters being weighted with the weighing coefficients; and

determining the at least one parameter of the object model based on the measured plurality of positional parameters, including determining a numerical value of at least one of the weighing coefficients together with the at least one parameter of the object model.

2. The method according to claim 1, wherein the at least one parameter of the object model includes at least one of translation, rotation, and expansion.

3. The method according to claim 1, wherein the plurality of alignment marks are formed as diffractive elements, and

wherein the plurality of positional parameters are determined based on diffraction lines generated by projecting an alignment beam to at least one of the plurality of alignment marks.

4. The method according to claim 1, wherein the plurality of alignment marks includes at least one multigrating.

5. The method according to claim 1, wherein determining the at least one parameter of the object model includes determining a least-squares solution of an expression based on a desired position and a measured position of at least one of the plurality of alignment marks.

6. The method according to claim 1, wherein the at least one parameter of the object model is solved by minimizing the expression

7. The method according to claim 1, wherein determining the at least one parameter of the object model includes setting a value of at least one weighing coefficient to zero when a signal strength of a corresponding positional parameter is determined to be below a predefined threshold.

8. The method according to claim 1, wherein the object is a substrate.

9. The method according to claim 1, wherein the plurality of positional parameters are measured for each alignment mark.

10. The method according to claim 1, further comprising:

subsequent to determining the at least one parameter of the object model, projecting a patterned beam of radiation onto a target portion of the object.

11. The method according to claim 10, wherein determining the numerical value of the at least one weighing coefficient is based on taking measurements of at least one object, and

wherein the method further comprises using the determined numerical value of the at least one of the weighing coefficients for the at least one object during a determination of at least one parameter of a second object model for at least one other object.

12. A lithographic device configured to receive a substrate having a plurality of alignment marks located thereon for which desired positions are known, the lithographic device comprising:

a beam generator that is arranged to project an alignment beam at the plurality of alignment marks to generate positional parameters for the alignment marks;

a sensor that is arranged to measure the positional parameters; and

a processing unit that receives the positional parameters and a signal strength indicator from the sensor, determines weighing coefficients for the positional parameters and determines at least one parameter of a substrate model to provide information about a position of the alignment mark based on the measured positional parameters, wherein the processing unit determines the weighing coefficients based on signal strength indicator received from the sensor, and wherein the processor unit is configured to determine a numerical value of at least one of the weighing coefficients together with the at least one parameter of the substrate model.

13. The lithographic device according to claim 12, wherein the at least one parameter of the substrate model includes at least one of translation, rotation, and expansion.

14. The lithographic device according to claim 12, wherein the plurality of alignment marks are formed as diffractive elements.

15. The lithographic device according to claim 12, wherein the processing unit is configured to determine the at least one parameter of the substrate model based on a least-squares solution of an expression using at least a desired position and a measured position of at least one of the plurality of alignment marks.

16. The lithographic device according to claim 12, wherein the processing unit is configured to set a value of at least one of the weighing coefficients to zero when a signal strength of the corresponding positional parameter is determined to be below a predefined threshold.

17. The lithographic device according to claim 12, comprising a projection system that is configured to project a patterned beam of radiation onto a target portion of the substrate based on values derived from the at least one parameter of the substrate model.

18. The lithographic device according to claim 12, wherein the beam generator projects the alignment beam at selected ones of the plurality of alignment marks to generate positional parameters for each of the selected alignment marks.

19. The lithographic device according to claim 12, wherein the processing unit is arranged to determine the numerical value of at least one of the weighing coefficients based on measurements taken for at least one substrate, and

wherein the processing unit is arranged to use the determined numerical value of the at least one of the weighing coefficients for the at least one substrate during a determination of at least one parameter of a second substrate model for at least one other substrate.

20. A method of determining a value for a parameter of an object model, the object model providing information about a position of an object having a plurality of alignment marks thereon, the method comprising:

receiving signals from the plurality of alignment marks;

obtaining a plurality of measured positions for a plurality of alignment marks from the received signals;

solving an expression to obtain a value for the parameter of the object model, the expression including the plurality of measured positions, at least one desired position for the plurality of alignment marks, and a plurality of weighting coefficients, each weighting coefficient corresponding to at least one of the plurality of measured positions, wherein the weighting coefficients are determined based on a strength of the received signals,

wherein a value of at least one of the weighting coefficients is based on the plurality of measured positions and the at least one desired position for the plurality of alignment marks.

21. The method according to claim 20, wherein solving the expression includes calculating a least-squares solution of the expression.

22. The method according to claim 20, wherein the value of at least one of the weighting coefficients is based on the value for the parameter of the object model.

23. The method according to claim 20, wherein the parameter of the model includes at least one of translation, rotation, and expansion.

24. The method according to claim 20, wherein the plurality of alignment marks are formed as diffractive elements and wherein obtaining the plurality of measured positions for the plurality of alignment marks includes directing a beam at the alignment mark and measuring at least a portion of a diffraction pattern.

25. A method of determining at least one parameter of an object model, the object model providing information about positions of a plurality of alignment marks that are located on an object, the method comprising:

projecting an alignment beam at selected ones of the plurality of alignment marks to generate one or more diffraction orders;

receiving signals corresponding to the one or more diffraction orders;

determining a strength of the received signals;

assigning a weighing coefficient to each of the one or more diffraction orders based on the strength of the received signals;

measuring a plurality of positional parameters for the selected ones of the plurality of alignment marks, the plurality of positional parameters being derived from corresponding weighing coefficients; and

determining the at least one parameter of the object model based on the measured plurality of positional parameters, including determining a numerical value of at least one of the weighing coefficients together with the at least one parameter of the object model.